SCHEMBL22991646

SCHEMBL22991646

COCCc1ccc(I)c(O)c1I

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22991625 0.78 TTR (0.37) —
SCHEMBL22991491 0.76 CA2 (0.33) —
SCHEMBL6559326 0.74 TYR (0.50) TSHR
SCHEMBL16124487 0.73 IAPP (0.50) —
SCHEMBL22991643 0.70 PRKCE (0.39) —
SCHEMBL22991639 0.70 TDP1 (0.44) —
SCHEMBL14484747 0.70 CYP4F2 (0.51) —
SCHEMBL22991651 0.68 TTR (0.42) —
SCHEMBL22991628 0.67 TTR (0.41) —
SCHEMBL12678892 0.67 GAA (0.39) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
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