SCHEMBL22991685

SCHEMBL22991685

CC(O)c1cc(I)c(OC(C)c2cc(I)c(O)c(I)c2)c(I)c1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 4/20 0.35
▸ THRB P10828 3/20 0.31
▸ THRA P10827 2/20 0.31
▸ RXRA P19793 2/20 0.31
▸ PPARG P37231 2/20 0.31
▸ ITGB3 P05106 1/20 0.31
▸ ITGAV P06756 1/20 0.31
▸ TPMT P51580 1/20 0.31
▸ MEN1 O00255 3/20 0.31
▸ KMT2A Q03164 3/20 0.31
▸ LMNA P02545 2/20 0.31
▸ ADORA3 P0DMS8 2/20 0.31
▸ PDE4D Q08499 2/20 0.31
▸ HSD17B10 Q99714 2/20 0.31
▸ NR3C1 P04150 1/20 0.31
▸ CYP1A2 P05177 1/20 0.31
▸ HTR1A P08908 1/20 0.31
▸ CYP2C9 P11712 1/20 0.31
▸ TBXA2R P21731 1/20 0.31
▸ NTSR1 P30989 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24589189 0.85 CCR3 (0.38) TPMTLMNACYP3A4MAPT
SCHEMBL22991571 0.82 TTR (0.50) TTRMEN1KMT2ALMNAHSD17B10
SCHEMBL22991686 0.74 TTR (0.46) TTRTHRBTHRARXRAPPARG
SCHEMBL29695995 0.73 APP (0.44) TTRLMNACYP3A4PTGS2
SCHEMBL24106144 0.73 APP (0.44) TTRLMNACYP3A4PTGS2
SCHEMBL22991586 0.72 TTR (0.44) TTRTPMTMEN1KMT2ALMNA
SCHEMBL22991681 0.69 TTR (0.31) TTRGABRA1GABRB1GABRB2
SCHEMBL30542147 0.69 MEN1 (0.36) TTRMEN1KMT2ALMNAHSD17B10
SCHEMBL7927718 0.67 TTR (0.52) TTRMEN1KMT2ALMNACYP1A2
SCHEMBL14827775 0.67 TTR (0.52) TTRMEN1KMT2ALMNAGABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
Send feedback