Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 2/20 | 0.52 |
| ▸ | GABRA1 | P14867 | 4/20 | 0.50 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.50 |
| ▸ | GABRB1 | P18505 | 3/20 | 0.48 |
| ▸ | ALB | P02768 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | RNASEH1 | O60930 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.39 |
| ▸ | FABP3 | P05413 | 2/20 | 0.38 |
| ▸ | FABP4 | P15090 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18778629 | 0.91 | PTGS1 (0.44) | TTRGABRA1GABRB2GABRB1ALB | |
| SCHEMBL4862739 | 0.89 | GABRA1 (0.63) | TTRGABRA1GABRB2GABRB1ALB | |
| SCHEMBL14827775 | 0.83 | TTR (0.52) | TTRGABRA1GABRB2GABRB1ALB | |
| SCHEMBL16271257 | 0.83 | APP (0.45) | TTRGABRA1GABRB2GABRB1CA1 | |
| SCHEMBL11402654 | 0.82 | CYP1A2 (0.38) | TTRGABRA1GABRB2GABRB1ALB | |
| SCHEMBL22991571 | 0.81 | TTR (0.50) | TTRGABRA1GABRB2GABRB1ALB | |
| Hydrochloric Acid SCHEMBL11658467 | 0.80 | CYP1A2 (0.37) | TTRGABRA1GABRB2GABRB1ALB | |
| SCHEMBL18855340 | 0.80 | TTR (0.55) | TTRGABRA1GABRB2GABRB1ALB | |
| SCHEMBL26303736 | 0.80 | GABRA1 (0.36) | GABRA1GABRB2GABRB1HTTPTGS1 | |
| SCHEMBL17813144 | 0.79 | GABRA1 (0.39) | TTRGABRA1GABRB2GABRB1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314942-A1 | POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314942-A1 | POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230296982-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-21 | — | — | US | disclosed |
| WO-2020159448-A1 | MOLECULAR RENAL PROBES FOR DETECTING ACUTE KIDNEY INJURY | NANYANG TECHNOLOGICAL UNIVERSITY (SG) | 2020-08-06 | — | — | WO | disclosed |
| US-10444627-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2019-10-15 | — | — | US | disclosed |
| US-20180120706-A1 | PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-9897922-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2018-02-20 | — | — | US | disclosed |
| EP-2723802-B1 | POLY(ARYLENE ETHER)-POLYSILOXANE COMPOSITION AND METHOD | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2017-04-19 | — | — | EP | disclosed |
| US-7323567-B2 | RSV polymerase inhibitors | BOEHRINGER INGELHEIM (CANADA) LTD. (CA) | 2008-01-29 | — | — | US | disclosed |
| US-20070225317-A1 | RSV POLYMERASE INHIBITORS | SIMONEAU BRUNO | 2007-09-27 | — | — | US | disclosed |
| EP-0707849-B1 | USE OF DERIVATIVES OF 2,4-DISUBSTITUTED PHENOLS AS 5-LIPOXIGENASE INHIBITORS | BOBEL246 S L (ES) | 2001-12-19 | — | — | EP | disclosed |
| EP-0707849-A1 | USE OF DERIVATIVES OF 2,4-BISUBSTITUTED PHENOLS AS 5-LIPOXIGENASE INHIBITORS | BOBEL246 S.L. (ES) | 1996-04-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070225317-A1 | RSV POLYMERASE INHIBITORS | POLR2E, POLR2H, POLR2A | TTR 2056/4885GABRA1 2396/4885GABRB2 3402/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.