⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11503357 | 1.00 | TSHR (0.43) | — | |
| SCHEMBL2541504 | 1.00 | TSHR (0.43) | — | |
| SCHEMBL2537877 | 1.00 | TSHR (0.43) | — | |
| SCHEMBL15767254 | 1.00 | TSHR (0.43) | — | |
| SCHEMBL2296137 | 1.00 | — | — | |
| SCHEMBL15767038 | 1.00 | TSHR (0.43) | — | |
| SCHEMBL366051 | 0.97 | — | — | |
| SCHEMBL246676 | 0.87 | — | — | |
| SCHEMBL1003333 | 0.83 | ALDH1A1 (0.58) | — | |
| SCHEMBL645518 | 0.83 | ALDH1A1 (0.58) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11320739-B2 | Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate | JSR CORPORATION (JP) | 2022-05-03 | — | — | US | claimed |
| EP-4317160-A1 | HETEROCYCLIC COMPOUND AND USE THEREOF | Kumiai Chemical Industry Co., Ltd. (JP) | 2024-02-07 | — | — | EP | disclosed |
| CN-117098759-A | Heterocyclic compounds and their use | 组合化学工业株式会社 | 2023-11-21 | — | — | CN | disclosed |
| US-20220177509-A1 | PRODUCTION OF BRIDGED ARTIFICIAL NUCLEOSIDES | NIPPON SHOKUBAI CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-11320739-B2 | Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate | JSR CORPORATION (JP) | 2022-05-03 | — | — | US | disclosed |
| EP-3950696-A1 | MANUFACTURING OF BRIDGED ARTIFICIAL NUCLEOSIDE | Nippon Shokubai Co., Ltd. (JP) | 2022-02-09 | — | — | EP | disclosed |
| CN-113710680-A | Preparation of cross-linked artificial nucleosides | 株式会社日本触媒 | 2021-11-26 | — | — | CN | disclosed |
| WO-2021085370-A1 | AZOLE DERIVATIVE AND USE THEREOF | クミアイ化学工業株式会社 | 2021-05-06 | — | — | WO | disclosed |
| WO-2020204022-A1 | MANUFACTURING OF BRIDGED ARTIFICIAL NUCLEOSIDE | 株式会社日本触媒 | 2020-10-08 | — | — | WO | disclosed |
| US-20180348633-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR PRODUCING PATTERNED SUBSTRATE | JSR CORPORATION (JP) | 2018-12-06 | — | — | US | disclosed |
| EP-1201678-B1 | NOVEL BICYCLONUCLEOSIDE ANALOGUES | SANKYO CO (JP) | 2004-09-22 | — | — | EP | disclosed |
| US-20040143114-A1 | Novel bicyclonucleoside analogues | SANKYO COMPANY, LIMITED (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1201678-A1 | NOVEL BICYCLONUCLEOSIDE ANALOGUES | Sankyo Company, Limited (JP) | 2002-05-02 | — | — | EP | disclosed |
| US-5652247-A | VASOPRESSIN ANTAGONIST | OTSUKA PHARMACEUTICAL CO., LTD (JP) | 1997-07-29 | — | — | US | disclosed |
| US-5436254-A | Vaopressin antagonists | OTSUKA PHARMACEUTICAL COMPANY, LTD. (JP) | 1995-07-25 | — | — | US | disclosed |
| EP-0602209-A1 | OXYTOCIN ANTAGONIST | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1994-06-22 | — | — | EP | disclosed |
| EP-0382185-B1 | Carbostyril derivatives | OTSUKA PHARMA CO LTD (JP) | 1994-06-15 | — | — | EP | disclosed |
| WO-1994001113-A1 | OXYTOCIN ANTAGONIST | OTSUKA PHARMACEUTICAL COMPANY, LIMITED (JP) | 1994-01-20 | — | — | WO | disclosed |
| US-5225402-A | Vasopressin antagonist, vasodilation, hypotensive, diuretics and anticoagulants | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1993-07-06 | — | — | US | disclosed |
| EP-0382185-A2 | Carbostyril derivatives | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1990-08-16 | — | — | EP | disclosed |