SCHEMBL23059477

SCHEMBL23059477

CC1(C)CC2(CCC(O)CC2)OC1=O

nearest known ligand 0.37

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 19/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16369101 0.80 HSD11B1 (0.37) HSD11B1
SCHEMBL16247897 0.80 HSD11B1 (0.39) HSD11B1
SCHEMBL18840118 0.80 HSD11B1 (0.38) HSD11B1
SCHEMBL19449910 0.79
SCHEMBL19449911 0.79
SCHEMBL19449912 0.79
SCHEMBL25906735 0.78 HSD11B1 (0.34) HSD11B1
SCHEMBL18792936 0.77 HSD11B1 (0.39) HSD11B1
SCHEMBL16575255 0.77 HSD11B1 (0.36) HSD11B1
SCHEMBL25793435 0.76 HSD11B1 (0.37) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021039407-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2021-03-04 WO disclosed