Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 4/20 | 0.36 |
| ▸ | THRA | P10827 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | CPT2 | P23786 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | HMGCR | P04035 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL8864275 | 1.00 | LMNA (0.53) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Acrylic Acid SCHEMBL5512672 | 1.00 | LMNA (0.53) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Acrylic Acid SCHEMBL30360549 | 1.00 | LMNA (0.53) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Acrylic Acid SCHEMBL29589240 | 1.00 | LMNA (0.53) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Acrylic Acid SCHEMBL11114820 | 1.00 | LMNA (0.53) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Benzene SCHEMBL28282177 | 0.95 | LMNA (0.48) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Pivalate SCHEMBL26601396 | 0.93 | LMNA (0.46) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Pivalate SCHEMBL29949709 | 0.93 | LMNA (0.46) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Acrylic Acid SCHEMBL28324845 | 0.91 | FFAR3 (0.43) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 | |
| Acrylic Acid SCHEMBL29521245 | 0.91 | FFAR3 (0.43) | LMNAALOX15HSD17B10ALDH1A1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 957 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121574335-A | Photo-curing resin, high-toughness adhesive product and preparation method thereof | 万华化学集团股份有限公司 | 2026-02-27 | — | — | CN | claimed |
| CN-120025501-A | Photo-curing hand paste resin system for low-temperature environment in winter and preparation method thereof | 重庆胜科检测技术有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-119912839-A | Preparation method of electron beam radiation curing gravure printing ink | 北京印刷学院 | 2025-05-02 | — | — | CN | claimed |
| CN-119798607-A | Preparation method and application of photo-curing resin | 万华化学集团股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-116574412-B | Preparation method of flame-retardant UV (ultraviolet) inkjet ink | 浙江浦江永进工贸有限公司 | 2024-07-02 | — | — | CN | claimed |
| CN-116574412-A | Preparation method of flame-retardant UV (ultraviolet) inkjet ink | 浙江浦江永进工贸有限公司 | 2023-08-11 | — | — | CN | claimed |
| CN-116239974-A | Film material and conductive adhesive film using the same | 南通德聚半导体材料有限公司 | 2023-06-09 | — | — | CN | claimed |
| CN-115561965-A | Solder resist dry film capable of resisting chemical reagent and preparation method thereof | 广东硕成科技股份有限公司 | 2023-01-03 | — | — | CN | claimed |
| US-11512235-B2 | Adhesive composition and polarizing plate comprising adhesive layer formed using same | SHANJIN OPTOELECTRONICS (SUZHOU) CO., LTD. (CN) | 2022-11-29 | — | — | US | claimed |
| CN-114806597-A | Liquid crystal composition, liquid crystal handwriting film and liquid crystal handwriting board | 深圳市小柔科技有限公司 | 2022-07-29 | — | — | CN | claimed |
| EP-1767558-A1 | Radiation-curable polyurethane resin compositions with controlled structures | Air Products and Chemicals, Inc. (US) | 2007-03-28 | — | — | EP | claimed |
| US-20070066751-A1 | Radiation-curable polyurethane resin compositions with controlled structures | AIR PRODUCTS AND CHEMICALS, INC. | 2007-03-22 | — | — | US | claimed |
| CN-1193083-C | Connecting material | SONY CHEMICALS CO LTD (JP) | 2005-03-16 | — | — | CN | claimed |
| US-6777478-B2 | CONNECTING INTEGRATED CIRCUITS; BLEND OF THERMOPLASTIC RESIN AND CURING AGENT | SONY CHEMICALS CORPORATION (JP) | 2004-08-17 | — | — | US | claimed |
| EP-0222059-B1 | IMPROVED RADIATION-HARDENABLE DILUENTS | HENKEL CORPORATION (a Delaware corp.) (US) | 1992-07-08 | — | — | EP | claimed |
| US-5110889-A | Lower alkyl ether acrylates of polyols; coatings | DIAMOND SHAMROCK CHEMICAL CO. (US) | 1992-05-05 | — | — | US | claimed |
| US-4876384-A | ALKYL ETHER ACRYLATES AND METHACRYLATES OF ALKOXYLATED AND NONALKOXYLATED POLYOLS; LOW VISCOSITY; SHRINKAGE INHIBITION | DIAMOND SHAMROCK CHEMICALS CO. (US) | 1989-10-24 | — | — | US | claimed |
| US-4678846-A | HIGH AND LOW MOLECULAR WEIGHT | TH. GOLDSCHMIDT AG (DE) | 1987-07-07 | — | — | US | claimed |
| EP-0222059-A2 | Improved radiation-hardenable diluents | HENKEL CORPORATION (a Delaware corp.) (US) | 1987-05-20 | — | — | EP | claimed |
| US-4192684-A | Photosensitive compositions containing hydrogenated 1,2-polybutadiene | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-03-11 | — | — | US | claimed |