SCHEMBL23089929

SCHEMBL23089929

CCCCCCCCOc1c2ccccc2cc2ccc(CC)cc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.44
CYP2A6 P11509 1/20 0.44
SLC2A1 P11166 1/20 0.42
CNR2 P34972 4/20 0.40
TLR8 Q9NR97 2/20 0.40
HDAC3 O15379 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC10 Q969S8 1/20 0.39
HDAC11 Q96DB2 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
HDAC6 Q9UBN7 1/20 0.39
HDAC9 Q9UKV0 1/20 0.39
HDAC5 Q9UQL6 1/20 0.39
CNR1 P21554 2/20 0.39
FAAH O00519 1/20 0.39
MGLL Q99685 1/20 0.39
PGR P06401 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23271891 1.00 CYP1A2 (0.44) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL23089953 1.00 CYP1A2 (0.44) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL29368346 1.00 CYP1A2 (0.44) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL29371219 1.00 CYP1A2 (0.44) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL29368501 1.00 CYP1A2 (0.44) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL23089942 1.00 CYP1A2 (0.44) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL29372406 0.99 CYP1A2 (0.45) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL23089949 0.99 CYP1A2 (0.45) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL23089902 0.94 CYP1A2 (0.46) CYP1A2CYP2A6SLC2A1CNR2TLR8
SCHEMBL29371017 0.94 CYP1A2 (0.46) CYP1A2CYP2A6SLC2A1CNR2TLR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 CN disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 CN disclosed
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 CN disclosed