Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.46 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
| ▸ | RORA | P35398 | 1/20 | 0.40 |
| ▸ | RORC | P51449 | 1/20 | 0.40 |
| ▸ | RORB | Q92753 | 1/20 | 0.40 |
| ▸ | CNR2 | P34972 | 2/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.39 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | SCN1A | P35498 | 1/20 | 0.38 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.38 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.38 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.38 |
| ▸ | HTR1B | P28222 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29371017 | 1.00 | CYP1A2 (0.46) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL23089949 | 0.96 | CYP1A2 (0.45) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL29372406 | 0.96 | CYP1A2 (0.45) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL29368346 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL23089953 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL29368501 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL23089942 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL23271891 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL23089929 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA | |
| SCHEMBL29371219 | 0.94 | CYP1A2 (0.44) | CYP1A2CYP2A6SLC2A1TDP1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109471330-B | Photosensitive composition and photopolymerization initiator used therein | 东京应化工业株式会社 | 2023-08-29 | — | — | CN | disclosed |
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2023-03-28 | — | — | US | disclosed |
| CN-110891980-B | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2022-09-30 | — | — | CN | disclosed |
| US-11352450-B2 | Photopolymerization sensitizer composition | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-06-07 | — | — | US | disclosed |
| CN-111868105-B | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-106970503-B | Photosensitive composition | 东京应化工业株式会社 | 2022-02-01 | — | — | CN | disclosed |
| US-20210122692-A1 | RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-04-29 | — | — | US | disclosed |
| US-20210079127-A1 | PHOTOPOLYMERIZATION SENSITIZER COMPOSITION | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-03-18 | — | — | US | disclosed |
| CN-112394617-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2021-02-23 | — | — | CN | disclosed |
| CN-111868105-A | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-111796482-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-10-20 | — | — | CN | disclosed |
| CN-111240156-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-110955114-A | Photosensitive resin composition, method for producing patterned cured film, and cured film | 东京应化工业株式会社 | 2020-04-03 | — | — | CN | disclosed |
| CN-110891980-A | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2020-03-17 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | PPOX, NOX4, CROCC | CYP1A2 611/4885CYP2A6 1731/4885SLC2A1 4456/4885 |
| US-20210122692-A1 | RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD | PPOX, NOX4, CROCC | CYP1A2 611/4885CYP2A6 1731/4885SLC2A1 4456/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.