SCHEMBL230975

SCHEMBL230975

CC1=C(C#N)C(c2ccc(C#N)cc2S(C)(=O)=O)n2nc(N)nc2N1c1cccc(C(F)(F)F)c1

nearest known ligand 0.67

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ELANE P08246 20/20 0.67
CYP3A4 P08684 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7904620 1.00 ELANE (0.67) ELANECYP3A4CYP2C9CYP2C19
Hydrochloric Acid SCHEMBL231082 0.99 ELANE (0.66) ELANECYP3A4CYP2C9CYP2C19
SCHEMBL2742318 0.89 ELANE (0.65) ELANECYP2C19
SCHEMBL2742319 0.89 ELANE (0.65) ELANECYP2C19
SCHEMBL15354362 0.87 ELANE (0.50) ELANECYP2C19
SCHEMBL15354374 0.87 ELANE (0.50) ELANECYP2C19
SCHEMBL14632124 0.87 ELANE (0.63) ELANECYP2C19
SCHEMBL230879 0.86 ELANE (0.64) ELANECYP3A4CYP2C9CYP2C19
SCHEMBL230772 0.86 ELANE (0.64) ELANECYP3A4CYP2C9CYP2C19
SCHEMBL231888 0.86 ELANE (0.62) ELANECYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 376 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230348750-A1 LOW INTERFERENCE FRINGE OPTICAL ARTICLE AND COATING AGENT COMPOSITION THEREOF NIPPON FINE CHEMICAL CO., LTD. (JP) 2023-11-02 US claimed
CN-115746616-A Surface-modified hollow silica particles and surface-modified hollow silica dispersion 凯斯科技股份有限公司 2023-03-07 CN claimed
JP-62182285-A None JP disclosed
US-6391433-B1 None US disclosed
US-20240228306-A9 DISPERSION OF EXFOLIATED PARTICLES OF LAYERED POLYSILICATE COMPOUND, AND METHOD FOR PRODUCING SAME NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY (JP) 2024-07-11 US disclosed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
US-20240184018-A1 SPECTACLE LENS AND SPECTACLES HOYA LENS THAILAND LTD. (TH) 2024-06-06 US disclosed
US-20240176163-A1 EYEGLASS LENS AND EYEGLASSES HOYA LENS THAILAND LTD. (TH) 2024-05-30 US disclosed
US-20240132365-A1 DISPERSION OF EXFOLIATED PARTICLES OF LAYERED POLYSILICATE COMPOUND, AND METHOD FOR PRODUCING SAME NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY (JP) 2024-04-25 US disclosed
WO-2024063044-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2024-03-28 WO disclosed
US-5075133-A Crosslinked polyvinyl alcohol in nitrogen containing solvent TORAY INDUSTRIES, INC. (JP) 1991-12-24 US disclosed
US-4940602-A FLUOROSILICONES TORAY INDUSTRIES, INC. (JP) 1990-07-10 US disclosed
US-4904525-A FLUOROPOLYSILICONE FILM ON A HARD-COATED PLASTIC SUBSTRATE; EYEGLASSES; CAMERA LENSES; DYEABILITY; DURABILITY; WEAR RESISTANCE TORAY INDUSTRIES, INC. (JP) 1990-02-27 US disclosed
US-4895767-A EPOXY RESIN, SILICON COMPOUND TORAY INDUSTRIES, INC. (JP) 1990-01-23 US disclosed
US-4835023-A Ornamental articles having coating membrane TORAY INDUSTRIES, INC. (JP) 1989-05-30 US disclosed
US-4765729-A POLYSILOXANES AS SURFACE COATINGS; SCRATCH RESISTANCE TORAY INDUSTRIES, INC. (JP) 1988-08-23 US disclosed
EP-0278060-A2 Anti-reflection optical article and process of producing the same TORAY INDUSTRIES, INC. (JP) 1988-08-17 EP disclosed
JP-S62182285-A METHOD FOR COATING METAL WITH POLYOLEFIN FURUKAWA ELECTRIC CO LTD:THE 1987-08-10 JP disclosed
EP-0119331-A1 Transparent material having antireflective coating TORAY INDUSTRIES, INC. (JP) 1984-09-26 EP disclosed