⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12256513 | 0.79 | — | — | |
| SCHEMBL24593060 | 0.79 | — | — | |
| SCHEMBL16286183 | 0.77 | — | — | |
| SCHEMBL11923101 | 0.77 | MAPT (0.32) | — | |
| SCHEMBL12310002 | 0.76 | — | — | |
| SCHEMBL12256275 | 0.76 | — | — | |
| SCHEMBL3870284 | 0.75 | — | — | |
| SCHEMBL3284772 | 0.74 | — | — | |
| SCHEMBL3881905 | 0.72 | — | — | |
| SCHEMBL16286184 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244143-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | JSR CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230244143-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | JSR CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| WO-2021140761-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2021-07-15 | — | — | WO | disclosed |
| WO-2021049592-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2021-03-18 | — | — | WO | disclosed |