⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18712238 | 0.90 | ALDH1A1 (0.32) | — | |
| SCHEMBL15608357 | 0.83 | — | — | |
| SCHEMBL23382975 | 0.83 | NPSR1 (0.32) | — | |
| SCHEMBL2279388 | 0.82 | TSHR (0.42) | — | |
| SCHEMBL8102131 | 0.81 | TSHR (0.32) | — | |
| SCHEMBL4582449 | 0.81 | — | — | |
| SCHEMBL23382974 | 0.81 | NPSR1 (0.33) | — | |
| SCHEMBL28864009 | 0.80 | TSHR (0.43) | — | |
| SCHEMBL8108180 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL13649534 | 0.78 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| WO-2023170261-A1 | READY-FOR-USE MILKY, VISCOUS AND STICKY PERFUME COMPLEX AND ASSOCIATED PERFUMED COMPOSITION | EXPRESSIONS PARFUMEES (FR) | 2023-09-14 | — | — | WO | disclosed |
| CN-107229185-B | Energy-sensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| US-20210114967-A1 | RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD | KANEKA CORPORATION (JP) | 2021-04-22 | — | — | US | disclosed |
| EP-3806593-A1 | RESIST COMPOSITION FOR PATTERN PRINTING USE, AND METHOD FOR MANUFACTURING CIRCUIT PATTERN USING SAME | KANEKA CORPORATION (JP) | 2021-04-14 | — | — | EP | disclosed |
| US-20210103216-A1 | RESIST COMPOSITION FOR PATTERN PRINTING, AND PRODUCTION METHOD OF CIRCUIT PATTERNS USING THE SAME | KANEKA CORPORATION (JP) | 2021-04-08 | — | — | US | disclosed |