SCHEMBL231668

SCHEMBL231668

CCN[Si](C)(C)NCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16840811 0.82
SCHEMBL233699 0.75 TP53 (0.33)
SCHEMBL147524 0.75
SCHEMBL16843975 0.71
SCHEMBL182211 0.70 TP53 (0.36)
SCHEMBL182151 0.70 TP53 (0.36)
SCHEMBL2104220 0.69
SCHEMBL10789369 0.69
SCHEMBL234574 0.69
SCHEMBL17991842 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 336 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119056491-B Supported catalyst for high-whiteness decabromodiphenyl ethane production and preparation process of high-whiteness decabromodiphenyl ethane 山东海王化工股份有限公司 2025-01-07 CN claimed
CN-119056491-A Supported catalyst for high-whiteness decabromodiphenyl ethane production and preparation process of high-whiteness decabromodiphenyl ethane 山东海王化工股份有限公司 2024-12-03 CN claimed
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US claimed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP claimed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US claimed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO claimed
US-20180135167-A1 Transparent Sheet Materials FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2018-05-17 US claimed
EP-3234216-A2 TRANSPARENT SHEET MATERIALS Fujifilm Manufacturing Europe BV (NL) 2017-10-25 EP claimed
US-7618913-B2 Coordination catalyst containing an organosilicon compound , nitrogen compound, transition metal compound and magnesiumon compound on catalyst support FORMOSA PLASTICS CORPORATION, U.S.A. (US) 2009-11-17 US claimed
WO-2008027479-A2 HIGHLY ACTIVE ALPHA-OLEFIN COPOLYMERIZATION CATALYST SYSTEM FORMOSA PLASTICS CORPORATION, U.S.A. (US) 2008-03-06 WO claimed
US-20080058198-A1 Highly active alpha-olefin copolymerization catalyst system FORMOSA PLASTICS CORPORATION, U.S.A. 2008-03-06 US claimed
US-20260076110-A1 HYBRID ATOMIC LAYER DEPOSITION LAM RES CORP (US) 2026-03-12 US disclosed
EP-3858496-B1 SURFACE TREATMENT METHOD AND SURFACE-TREATED ARTICLE DAIKIN IND LTD (JP) 2026-01-07 EP disclosed
US-20250372367-A1 DEPOSITION AND ETCH OF SILICON-CONTAINING LAYER LAM RES CORP (US) 2025-12-04 US disclosed
EP-3904079-B1 GAS BARRIER LAMINATE LINTEC CORP (JP) 2025-10-29 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed
EP-0713153-A2 Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner CANON KABUSHIKI KAISHA (JP) 1996-05-22 EP disclosed
EP-0216633-A2 Composite membrane comprising porous hollow fibers and process for producing the same SUMITOMO ELECTRIC INDUSTRIES LIMITED (JP) 1987-04-01 EP disclosed
US-4539367-A ROOM TEMPERATURE VULCANIZABLE SILICONE RUBBERS GENERAL ELECTRIC COMPANY (US) 1985-09-03 US disclosed
US-4513115-A ROOM TEMPERATURE VULCANIZABLE POLYALKOXY-TERMINATED POLYSILOXANE AND HYDROLIZABLE SCAVENGER, SHELF LIFE GENERAL ELECTRIC COMPANY (US) 1985-04-23 US disclosed