SCHEMBL2321092

SCHEMBL2321092

c1ccc2c(C3CCO3)cccc2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 6/20 0.54
SLC6A2 P23975 2/20 0.54
SLC6A3 Q01959 2/20 0.54
KDM1A O60341 1/20 0.48
DRD2 P14416 1/20 0.45
MTNR1A P48039 1/20 0.41
IDO1 P14902 1/20 0.41
PLA2G6 O60733 3/20 0.41
MAPK1 P28482 3/20 0.41
ALDH1A1 P00352 2/20 0.41
MAPT P10636 2/20 0.41
HPGD P15428 2/20 0.41
BLM P54132 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
FAAH O00519 1/20 0.41
NPC1 O15118 1/20 0.41
GMNN O75496 1/20 0.41
LMNA P02545 1/20 0.41
MTOR P42345 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30473345 0.91 SLC6A4 (0.50) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL2032834 0.89 SLC6A4 (0.49) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL5852684 0.83 SLC6A4 (0.53) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL10300820 0.83 SLC6A4 (0.53) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL2464189 0.83 SLC6A4 (0.53) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL3073148 0.82 SLC6A4 (0.45) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL27991611 0.80 SLC6A4 (0.51) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL694465 0.79 SLC6A4 (0.50) SLC6A4SLC6A2SLC6A3KDM1ADRD2
SCHEMBL2599486 0.79 DRD2 (0.49) SLC6A4SLC6A2SLC6A3KDM1ADRD2
Methyl Alcohol SCHEMBL8766877 0.78 SLC6A4 (0.49) SLC6A4SLC6A2SLC6A3KDM1ADRD2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9061499-B2 Negative photosensitive resin composition, pattern formation method, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-06-23 US disclosed
US-8944580-B2 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-02-03 US disclosed
CN-102741749-B Negative photosensitive resin composition, pattern formation method, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2014-10-08 CN disclosed
EP-2531891-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD Canon Kabushiki Kaisha (JP) 2012-12-12 EP disclosed
US-20120306961-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2012-12-06 US disclosed
CN-102741749-A Negative photosensitive resin composition, pattern formation method, and liquid discharge head CANON KK 2012-10-17 CN disclosed
US-20120229556-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING STRUCTURAL BODY, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2012-09-13 US disclosed
WO-2011096552-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING STRUCTURAL BODY, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2011-08-11 WO disclosed
WO-2011096458-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2011-08-11 WO disclosed
EP-1069120-B1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound TOAGOSEI CO LTD (JP) 2003-08-13 EP disclosed
US-6469108-B2 REACTING A DIHYDROXYNAPHTHALENE WITH 3-ALKYL-3-CHLOROMETHYLOXETANE OR 3-CHLOROMETHYLOXETANE IN PRESENCE OF ALKALI METAL HYDROXIDE, ALKALI METAL HYDRIDE OR ALKALI METAL TOAGOSEI CO., LTD. (JP) 2002-10-22 US disclosed
US-20020103330-A1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound TOAGOSEI CO., LTD. 2002-08-01 US disclosed
US-6365760-B1 BIS(3-ALKYLOXETAN-3-YL)-METHOXY)BIPHENYL COMPOUNDS USED AS OPTICAL MATERIALS; WORKABILITY; LOW VISCOSITY; HIGH REFRACTIVE INDEX; PHOTO AND THERMOCURING; TOAGOSEI CO., LTD. (JP) 2002-04-02 US disclosed
EP-1069120-A1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound TOAGOSEI CO., LTD. (JP) 2001-01-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020103330-A1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound NDC1, BECN1, NUCB2 SLC6A4 2248/4885SLC6A2 3423/4885SLC6A3 3442/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.