⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12986322 | 0.81 | LMNA (0.63) | — | |
| SCHEMBL28365511 | 0.79 | LMNA (0.60) | — | |
| SCHEMBL20610035 | 0.78 | LMNA (0.56) | — | |
| SCHEMBL9403620 | 0.78 | LMNA (0.56) | — | |
| SCHEMBL12986442 | 0.78 | TSHR (0.30) | — | |
| SCHEMBL1441491 | 0.78 | LMNA (0.43) | — | |
| SCHEMBL8373093 | 0.76 | — | — | |
| SCHEMBL2885318 | 0.76 | — | — | |
| SCHEMBL3887820 | 0.73 | — | — | |
| SCHEMBL20943629 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240132448-A1 | ORGANIC COMPOUNDS AND USES THEREOF | Zhejiang Brilliant Optoelectronic Technology Co.,Ltd. (CN) | 2024-04-25 | — | — | US | disclosed |
| CN-117777133-A | Organic compound and application thereof | 浙江光昊光电科技有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-117529482-A | Organic heterocyclic compound and application thereof in organic light-emitting diode | 浙江光昊光电科技有限公司 | 2024-02-06 | — | — | CN | disclosed |
| CN-117412942-A | Organic compound and application thereof | 浙江光昊光电科技有限公司 | 2024-01-16 | — | — | CN | disclosed |
| US-20230295818-A1 | AMMONIA PRODUCTION METHOD AND AMMONIA PRODUCTION APPARATUS | THE UNIVERSITY OF TOKYO (JP) | 2023-09-21 | — | — | US | disclosed |
| CN-116063332-A | Organic heterocyclic compound and application thereof | 马端人 | 2023-05-05 | — | — | CN | disclosed |
| WO-2023284654-A1 | ORGANIC HETEROCYCLIC COMPOUND AND APPLICATION THEREOF IN ORGANIC LIGHT EMITTING DIODE | 浙江光昊光电科技有限公司 | 2023-01-19 | — | — | WO | disclosed |
| EP-3372581-B1 | FULLERENE DERIVATIVE AND n-TYPE SEMICONDUCTOR MATERIAL | DAIKIN IND LTD (JP) | 2021-06-23 | — | — | EP | disclosed |
| US-10894770-B2 | Fullerene derivative and n-type semiconductor material | DAIKIN INDUSTRIES, LTD. (JP) | 2021-01-19 | — | — | US | disclosed |
| WO-2020071470-A1 | PHTHALOCYANINE COMPOUND AND USE THEREOF | 山本化成株式会社 | 2020-04-09 | — | — | WO | disclosed |
| US-20050208425-A1 | Imide compound and optical recording media made by using the same | YAMAMOTO CHEMICALS, INC. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1445115-A1 | IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME | Mitsui Chemicals, Inc. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| US-6492364-B1 | Triazolo and derivatives as chemokine inhibitors | TORAY INDUSTRIES, INC. (JP) | 2002-12-10 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| EP-1067130-A1 | TRIAZOLO DERIVATIVES AND CHEMOKINE INHIBITORS CONTAINING THE SAME AS THE ACTIVE INGREDIENT | TORAY INDUSTRIES, INC. (JP) | 2001-01-10 | — | — | EP | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |