Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propanol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propanol SCHEMBL1134197 | 1.00 | ALDH1A1 (0.67) | — | |
| Propanol SCHEMBL10701786 | 0.92 | ALDH1A1 (0.54) | — | |
| Butane SCHEMBL140727 | 0.92 | — | — | |
| Propylamine SCHEMBL133777 | 0.92 | — | — | |
| Propanol SCHEMBL8351024 | 0.92 | ALDH1A1 (0.54) | — | |
| Propylamine SCHEMBL28320603 | 0.92 | — | — | |
| Propylamine SCHEMBL327066 | 0.92 | ALDH1A1 (0.67) | — | |
| Propanol SCHEMBL11490303 | 0.92 | — | — | |
| Butane SCHEMBL10530627 | 0.88 | ALDH1A1 (0.61) | — | |
| Propylamine SCHEMBL8890385 | 0.88 | ALDH1A1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114200794-A | Photoresist stripping liquid composition | 珠海市丹尼尔电子科技有限公司 | 2022-03-18 | — | — | CN | claimed |
| EP-1904898-B1 | METHOD FOR FINE LINE RESIST STRIPPING | ATOTECH DEUTSCHLAND GMBH (DE) | 2011-08-17 | — | — | EP | claimed |
| CN-101185034-A | Method for fine line resist stripping | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-21 | — | — | CN | claimed |
| EP-1904898-A1 | METHOD FOR FINE LINE RESIST STRIPPING | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-04-02 | — | — | EP | claimed |
| WO-2006128642-A1 | METHOD FOR FINE LINE RESIST STRIPPING | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-12-07 | — | — | WO | claimed |
| EP-1729179-A1 | Method for fine line resist stripping | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-12-06 | — | — | EP | claimed |
| CN-115380102-B | Water-glycol hydraulic fluid | 国际壳牌研究有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-116406418-A | Water-glycol hydraulic fluid | 国际壳牌研究有限公司 | 2023-07-07 | — | — | CN | disclosed |
| CN-114200794-A | Photoresist stripping liquid composition | 珠海市丹尼尔电子科技有限公司 | 2022-03-18 | — | — | CN | disclosed |
| EP-1904898-B1 | METHOD FOR FINE LINE RESIST STRIPPING | ATOTECH DEUTSCHLAND GMBH (DE) | 2011-08-17 | — | — | EP | disclosed |
| CN-101185034-A | Method for fine line resist stripping | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-21 | — | — | CN | disclosed |
| EP-1904898-A1 | METHOD FOR FINE LINE RESIST STRIPPING | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-04-02 | — | — | EP | disclosed |
| WO-2006128642-A1 | METHOD FOR FINE LINE RESIST STRIPPING | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-12-07 | — | — | WO | disclosed |
| EP-1729179-A1 | Method for fine line resist stripping | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-12-06 | — | — | EP | disclosed |
| US-5102777-A | Immersion solution consists of a solvent, amine and fatty acid , corrosion and chemical resistance to underlying metal layer | ARDROX INC. (US) | 1992-04-07 | — | — | US | disclosed |