Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.38 |
| ▸ | CA2 | P00918 | 4/20 | 0.38 |
| ▸ | CA7 | P43166 | 3/20 | 0.38 |
| ▸ | CA9 | Q16790 | 3/20 | 0.38 |
| ▸ | CA4 | P22748 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.38 |
| ▸ | LTA4H | P09960 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.34 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 2/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.31 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19397154 | 0.81 | KMT2A (0.32) | KMT2A | |
| SCHEMBL2358688 | 0.78 | GABRG2 (0.39) | CA1CA2CA7CA9CA4 | |
| SCHEMBL2325405 | 0.75 | — | — | |
| SCHEMBL31547606 | 0.73 | — | — | |
| SCHEMBL2791561 | 0.73 | — | — | |
| SCHEMBL3441739 | 0.73 | — | — | |
| Bromide SCHEMBL9622942 | 0.73 | NPC1 (0.42) | CA1CA2CA7CA9CA4 | |
| SCHEMBL2329551 | 0.73 | — | — | |
| SCHEMBL12276408 | 0.73 | — | — | |
| SCHEMBL15028317 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250004378-A1 | Pattern Forming Method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| EP-4474912-A2 | PATTERN FORMING METHOD | Shin-Etsu Chemical Co., Ltd. (JP) | 2024-12-11 | — | — | EP | disclosed |
| EP-4474911-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-11 | — | — | EP | disclosed |
| CN-119087742-A | Pattern forming method | 信越化学工业株式会社 | 2024-12-06 | — | — | CN | disclosed |
| CN-119087741-A | Composition for forming resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-06 | — | — | CN | disclosed |
| US-20240402606-A1 | Composition For Forming Resist Underlayer Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-05 | — | — | US | disclosed |
| US-20240337944-A1 | Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film | SHIN- ETSU CHEMICAL CO., LTD. (JP) | 2024-10-10 | — | — | US | disclosed |
| EP-4425261-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERN FORMING METHOD, AND METHOD OF FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-04 | — | — | EP | disclosed |
| CN-118584753-A | Resist underlayer film material, pattern forming method, and resist underlayer film forming method | 信越化学工业株式会社 | 2024-09-03 | — | — | CN | disclosed |
| US-20230400770-A1 | Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20100126386-A1 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2010-05-27 | — | — | US | disclosed |
| WO-2010055050-A1 | RADIATION CURABLE COATING MATERIALS | BASF SE (DE) | 2010-05-20 | — | — | WO | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080153030-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
| WO-2008058885-A2 | RADIATION-HARDENABLE COATING MASSES | BASF SE (DE) | 2008-05-22 | — | — | WO | disclosed |
| WO-2007138095-A1 | USE OF STABILIZING COMPOSITIONS CONTAINING CYANINE CATIONS IN PACKAGING MATERIALS | BASF SE (DE) | 2007-12-06 | — | — | WO | disclosed |
| EP-1820064-A2 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2007-08-22 | — | — | EP | disclosed |
| WO-2006058731-A2 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2006-06-08 | — | — | WO | disclosed |
| US-6110987-A | CURED PRODUCTS HAVING AN EXCELLENT APPEARANCE WITHOUT COLORING CAUSED BY POLYMERIZATION INITIATOR | SHOWA DENKO K.K. (JP) | 2000-08-29 | — | — | US | disclosed |