Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 4/20 | 0.31 |
| ▸ | CTSB | P07858 | 3/20 | 0.31 |
| ▸ | CTSL | P07711 | 2/20 | 0.31 |
| ▸ | CTSH | P09668 | 2/20 | 0.31 |
| ▸ | CTSS | P25774 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2330176 | 0.84 | MAPT (0.34) | CHRM1CTSKCTSBCTSLCTSH | |
| SCHEMBL5874768 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL12311403 | 0.77 | EPHX2 (0.34) | CHRM1 | |
| SCHEMBL11887150 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL17488481 | 0.74 | ALDH1A1 (0.33) | CHRM1 | |
| SCHEMBL8827349 | 0.73 | SLC6A2 (0.35) | — | |
| SCHEMBL12311413 | 0.73 | EPHX2 (0.34) | CHRM1 | |
| SCHEMBL7718861 | 0.72 | ALDH1A1 (0.36) | — | |
| SCHEMBL5074820 | 0.72 | ALDH1A1 (0.31) | — | |
| SCHEMBL5856414 | 0.71 | DPP7 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808975-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| EP-1764647-B1 | Use of a positive resist composition for immersion exposure, positive resist composition and immersion lithographic pattern-forming method using the same | FUJIFILM CORP (JP) | 2011-08-17 | — | — | EP | disclosed |
| US-20100310991-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-7803511-B2 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJIFILM CORPORATION (JP) | 2010-09-28 | — | — | US | disclosed |
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| EP-1764647-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |