SCHEMBL23319722

SCHEMBL23319722

CCNC(C)C.[SiH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3608 0.96
Hydrochloric Acid SCHEMBL11064037 0.92
SCHEMBL28166849 0.92
Ammonia Solution, Strong SCHEMBL21596295 0.92
Fluoride SCHEMBL25337972 0.92
Propane SCHEMBL5723751 0.92
Ammonia Solution, Strong SCHEMBL11717158 0.92
SCHEMBL29921519 0.92
Methylamine SCHEMBL6865611 0.89
Methylene Chloride SCHEMBL26983527 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3535436-B1 PRECURSORS AND FLOWABLE CVD METHODS FOR MAKING LOW-K FILMS TO FILL SURFACE FEATURES VERSUM MAT US LLC (US) 2021-05-12 EP claimed
EP-3535436-B1 PRECURSORS AND FLOWABLE CVD METHODS FOR MAKING LOW-K FILMS TO FILL SURFACE FEATURES VERSUM MAT US LLC (US) 2021-05-12 EP disclosed