⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3918604 | 1.00 | — | — | |
| SCHEMBL3925088 | 1.00 | — | — | |
| SCHEMBL2335369 | 0.91 | — | — | |
| SCHEMBL2329969 | 0.91 | — | — | |
| SCHEMBL3681282 | 0.87 | — | — | |
| SCHEMBL9449581 | 0.85 | — | — | |
| SCHEMBL226488 | 0.84 | LMNA (0.35) | — | |
| SCHEMBL3774988 | 0.84 | LMNA (0.35) | — | |
| SCHEMBL969176 | 0.84 | LMNA (0.35) | — | |
| SCHEMBL422532 | 0.84 | LMNA (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1947717-B1 | ELECTRODE CATALYST LAYER | JSR CORP (JP) | 2013-02-13 | — | — | EP | disclosed |
| US-8236206-B2 | Electrode catalyst layer | JSR CORPORATION (JP) | 2012-08-07 | — | — | US | disclosed |
| US-8003160-B2 | Preventing undesired spreading of metal microparticles and disconnection using a liquid repellant membrane comprising a polyimide, silicone dioxide microparticles for surface roughness, and a perfluorinated polyether (Krytox) having either phenylamide ends or alkoxysilane terminal groups for solubility | RICOH PRINTING SYSTEMS, LTD. (JP) | 2011-08-23 | — | — | US | disclosed |
| US-20090134360-A1 | ELECTRODE CATALYST LAYER | JSR CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| CN-100432140-C | Liquid curable resin composition, cured film, and laminate | JSR CORP (JP) | 2008-11-12 | — | — | CN | disclosed |
| US-7419707-B2 | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2008-09-02 | — | — | US | disclosed |
| EP-1947717-A1 | ELECTRODE CATALYST LAYER | JSR Corporation (JP) | 2008-07-23 | — | — | EP | disclosed |
| US-20070172646-A1 | Liquid resin composition, cured film and laminate | JSR CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070154626-A1 | Wiring substrate | RICOH COMPANY, LTD. (JP) | 2007-07-05 | — | — | US | disclosed |
| CN-1922265-A | Manufacturing method of laminated body | JSR CORP (JP) | 2007-02-28 | — | — | CN | disclosed |
| US-20050158528-A1 | Wiring substrate | RICOH PRINTING SYSTEMS, LTD. (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6832949-B2 | Window member for chemical mechanical polishing and polishing pad | JSR CORPORATION (JP) | 2004-12-21 | — | — | US | disclosed |
| US-20030129931-A1 | Window member for chemical mechanical polishing and polishing pad | JSR CORPORATION (JP) | 2003-07-10 | — | — | US | disclosed |
| EP-1306163-A1 | Window member for chemical mechanical polishing and polishing pad | JSR Corporation (JP) | 2003-05-02 | — | — | EP | disclosed |
| EP-0953584-B1 | Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating | JSR CORP (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6271326-B1 | ETHYLENE-TETRAFLUOROETHYLENE-STYRENE POLYMERS AND VINYL ACETATE OR ACRYLIC ACID POLYMERS | JSR CORPORATION (JP) | 2001-08-07 | — | — | US | disclosed |
| US-6087072-A | Article having a light-controllable super-water-repellent surface and a printing machine using the article | HITACHI, LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| US-6051665-A | A FLUOROPOLYMER IS OBTAINED FROM THE MONOMER SELECTED FROM THE GROUP CONTAINING A FLUORO-OLEFIN, A FLUORO VINYL ETHER, A FLUORO (METH) ACRYLATE AND MIXTURE, ALSO CONTAIN HYDROLYZABLE SILYL GROUP, A SILOXY COMPOUND AND A CHELATE COMPLEX | JSR CORPORATION (JP) | 2000-04-18 | — | — | US | disclosed |
| US-6027852-A | Article having a light-controllable super-water-repellent surface and a printing machine using the article | HITACHI, LTD. (JP) | 2000-02-22 | — | — | US | disclosed |
| EP-0953584-A1 | Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating | JSR Corporation (JP) | 1999-11-03 | — | — | EP | disclosed |