Edetic Acid

Edetic Acid

SCHEMBL2334729

N.N.O=C(O)CN(CCN(CC(=O)O)CC(=O)O)CC(=O)O.[BaH2]

nearest known ligand 0.88

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.88
EYA2 O00167 1/20 0.88
APP P05067 1/20 0.88
ACE P12821 1/20 0.88
BLM P54132 2/20 0.82
PMP22 Q01453 2/20 0.82
KDM4E B2RXH2 2/20 0.82
ALOX15 P16050 2/20 0.82
TSHR P16473 2/20 0.82
LMNA P02545 1/20 0.82
CHRM2 P08172 1/20 0.82
ADRA2A P08913 1/20 0.82
DRD1 P21728 1/20 0.82
SLC6A2 P23975 1/20 0.82
SLC6A4 P31645 1/20 0.82
CYP2C19 P33261 1/20 0.82
ADRA1A P35348 1/20 0.82
DRD3 P35462 1/20 0.82
SLC6A3 Q01959 1/20 0.82
HRH3 Q9Y5N1 1/20 0.82

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Edetic Acid SCHEMBL1832119 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL119008 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL602070 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL394052 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL17097349 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL7082514 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL3735469 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL1079425 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL413599 0.94 TDP1 (0.88) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL8179486 0.94 TDP1 (0.88) TDP1EYA2APPACEBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1088787-B1 PROCESS FOR PRODUCING METAL OXIDE, TARGET COMPRISING THE METAL OXIDE FOR FORMING THIN METAL OXIDE FILM, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING THIN METAL OXIDE FILM CHUBU CHELEST CO LTD (JP) 2011-08-24 EP disclosed
US-6797338-B2 METAL AND AMINO-CARBOXYLIC ACID CHELATING AGENT COMPLEX IS SUBJECTEDTO A PVD PROCESS, THEREBY FORMING THE THIN METAL OXIDE FILM CHUBU CHELEST CO., LTD. (JP) 2004-09-28 US disclosed
US-20040047989-A1 Amorphous powder containing organic metal chelate complexes is used as raw material for producing a metal oxide HIDETOSHI SAITOH (JP) 2004-03-11 US disclosed
US-6589453-B1 Process for preparing a target for use in the production of a thin metal oxide film CHUBU CHELEST CO., LTD. (JP) 2003-07-08 US disclosed
EP-1088787-A1 PROCESS FOR PRODUCING METAL OXIDE, TARGET COMPRISING THE METAL OXIDE FOR FORMING THIN METAL OXIDE FILM, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING THIN METAL OXIDE FILM Chubu Chelest Co. Ltd. (JP) 2001-04-04 EP disclosed