Succinic Acid

Succinic Acid

SCHEMBL233529

C=CC(=O)O.C=CC(=O)O.C=CC(=O)O.O=C(O)CCC(=O)O.OCC(CO)(CO)CO

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRB1CDK4CDK6CHRM2CHRM3DPP4DRD2DRD3DRD4EGFRHRH1HTR1BHTR1DHTR1FHTR2AHTR2CHTR4SLC6A2SLC6A4

The experimentally established mechanism targets of Succinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 known ✓ P23975 1/20 0.40
SLC6A4 known ✓ P31645 1/20 0.40
LMNA P02545 5/20 0.48
MAPK1 P28482 2/20 0.43
ALDH1A1 P00352 1/20 0.43
TP53 P04637 1/20 0.43
CYP3A4 P08684 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
HIF1A Q16665 1/20 0.43
EGLN1 Q9GZT9 3/20 0.43
ALKBH5 Q6P6C2 1/20 0.43
SUCNR1 Q9BXA5 1/20 0.43
ALOX15 P16050 1/20 0.41
HSD17B10 Q99714 1/20 0.41
TSHR P16473 2/20 0.40
NFKB1 P19838 2/20 0.40
BLM P54132 1/20 0.40
SLC6A3 Q01959 1/20 0.40
MEN1 O00255 1/20 0.40
CYP2D6 P10635 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Succinic Acid SCHEMBL28712800 1.00 LMNA (0.48) LMNAMAPK1ALDH1A1TP53CYP3A4
Succinic Acid SCHEMBL10897257 1.00 LMNA (0.48) LMNAMAPK1ALDH1A1TP53CYP3A4
Succinic Acid SCHEMBL231928 1.00 LMNA (0.48) LMNAMAPK1ALDH1A1TP53CYP3A4
Adipic Acid SCHEMBL10772168 0.91 ABCC4 (0.48) LMNAMAPK1ALDH1A1TP53CYP3A4
Adipic Acid SCHEMBL38651009 0.91 ABCC4 (0.48) LMNAMAPK1ALDH1A1TP53CYP3A4
Acrylic Acid SCHEMBL2783417 0.90 LMNA (0.59) LMNAMAPK1ALDH1A1TP53CYP3A4
Acrylic Acid SCHEMBL9847746 0.90 LMNA (0.59) LMNAMAPK1ALDH1A1TP53CYP3A4
Acrylic Acid SCHEMBL151893 0.90 LMNA (0.59) LMNAMAPK1ALDH1A1TP53CYP3A4
Acrylic Acid SCHEMBL14762290 0.90 LMNA (0.59) LMNAMAPK1ALDH1A1TP53CYP3A4
Acrylic Acid SCHEMBL4623894 0.90 LMNA (0.59) LMNAMAPK1ALDH1A1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240218244-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
WO-2024111420-A1 ALKALI-SOLUBLE RESIN, LIGHT-SENSITIVE RESIN COMPOSITION, METHODS RESPECTIVELY FOR PRODUCING THOSE, AND USE OF THOSE 株式会社日本触媒 2024-05-30 WO disclosed
US-20240166791-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-23 US disclosed
WO-2024084904-A1 CURABLE COMPOSITION, CURED FILM, AND DISPLAY DEVICE 住友化学株式会社 2024-04-25 WO disclosed
WO-2024053609-A1 ALKALI-SOLUBLE RESIN, METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, MEMBER FOR DISPLAY DEVICE, AND DISPLAY DEVICE 株式会社日本触媒 2024-03-14 WO disclosed
EP-4332123-A1 CURED FILM AND DISPLAY DEVICE Sumitomo Chemical Company Limited (JP) 2024-03-06 EP disclosed
EP-4332122-A1 CURED FILM AND DISPLAY DEVICE Sumitomo Chemical Company, Limited (JP) 2024-03-06 EP disclosed
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023218876-A1 ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, AND CURED PRODUCT THEREOF 株式会社日本触媒 2023-11-16 WO disclosed
US-20230340289-A1 PHOTOSENSITIVE COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-26 US disclosed
EP-2169463-A2 Colored curable composition, color filter and method for producing the same FUJIFILM Corporation (JP) 2010-03-31 EP disclosed
EP-2112182-A1 Polymerizable composition, light-shielding color filter, black curable composition, light-shielding color filter for solid-state image pickup device and method of producing the same, and solid-state image pickup device FUJIFILM Corporation (JP) 2009-10-28 EP disclosed
US-20090117330-A1 ORIGINAL SHEET OF EMBOSSED RELEASE SHEET, EMBOSSED RELEASE SHEET, METHOD FOR MANUFACTURING ORIGINAL SHEET OF EMBOSSED RELEASE SHEET, METHOD FOR MANUFACTURING EMBOSSED RELEASE SHEET, APPARATUS FOR MANUFACTURING EMBOSSED RELEASE SHEET, SYNTHETIC LEATHER, AND METHOD FOR MANUFACTURING SYNTHETIC LEATHER DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-07 US disclosed
CN-100475518-C Embossed release paper for production of synthetic leather, support thereof, synthetic leather utilizing the release paper and process for producing the same DAINIPPON PRINTING CO LTD (JP) 2009-04-08 CN disclosed
EP-1992479-A1 ORIGINAL SHEET OF EMBOSSED RELEASE SHEET, EMBOSSED RELEASE SHEET, METHOD FOR PRODUCING ORIGINAL SHEET OF EMBOSSED RELEASE SHEET, METHOD FOR PRODUCING EMBOSSED RELEASE SHEET, APPARATUS FOR PRODUCING EMBOSSED RELEASE SHEET, SYNTHETIC LEATHER, AND METHOD FOR PRODUCING SYNTHETIC LEATHER Dainippon Printing Co., Ltd. (JP) 2008-11-19 EP disclosed
US-20070116929-A1 Embossed release paper for synthetic leather production and support therefor, and synthetic leather using the release paper and process for producing the synthetic leather DAI NIPPON PRINTING CO., LTD. (JP) 2007-05-24 US disclosed
CN-1922007-A Embossed release paper for production of synthetic leather, support thereof, synthetic leather utilizing the release paper and process for producing the same DAINIPPON PRINTING CO LTD (JP) 2007-02-28 CN disclosed
EP-1702752-A1 EMBOSSED RELEASE PAPER FOR PRODUCTION OF SYNTHETIC LEATHER, SUPPORT THEREOF, SYNTHETIC LEATHER UTILIZING THE RELEASE PAPER AND PROCESS FOR PRODUCING THE SAME Dainippon Printing Co., Ltd. (JP) 2006-09-20 EP disclosed
US-20030118838-A1 Laminate, adhering method and active energy ray-curable composition MITSUBISHI CHEMICAL CORPORATION (JP) 2003-06-26 US disclosed
EP-1275496-A1 LAYERED PRODUCT, BONDING METHOD, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY MITSUBISHI CHEMICAL CORPORATION (JP) 2003-01-15 EP disclosed