⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19658328 | 0.67 | — | — | |
| SCHEMBL339497 | 0.61 | — | — | |
| SCHEMBL10527253 | 0.61 | — | — | |
| SCHEMBL30504 | 0.61 | — | — | |
| SCHEMBL949878 | 0.61 | — | — | |
| SCHEMBL2597609 | 0.61 | — | — | |
| SCHEMBL703343 | 0.61 | — | — | |
| SCHEMBL11407141 | 0.61 | — | — | |
| SCHEMBL3872276 | 0.61 | — | — | |
| SCHEMBL31627771 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 274 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10790139-B2 | Deposition of silicon and oxygen-containing films without an oxidizer | APPLIED MATERIALS, INC. (US) | 2020-09-29 | — | — | US | claimed |
| CN-105899711-B | Deposition of silicon and oxygen containing films in the absence of oxidizing agents | 应用材料公司 | 2020-01-07 | — | — | CN | claimed |
| US-20160336174-A1 | DEPOSITION OF SILICON AND OXYGEN-CONTAINING FILMS WITHOUT AN OXIDIZER | APPLIED MATERIALS, INC. (US) | 2016-11-17 | — | — | US | claimed |
| US-8759200-B2 | Methods and apparatus for selective epitaxy of Si-containing materials and substitutionally doped crystalline Si-containing material | MATHESON TRI-GAS, INC. (US) | 2014-06-24 | — | — | US | claimed |
| WO-2014070600-A1 | METHODS FOR SELECTIVE AND CONFORMAL EPITAXY OF HIGHLY DOPED SI-CONTAINING MATERIALS FOR THREE DIMENSIONAL STRUCTURES | MATHESON TRI-GAS, INC. (US) | 2014-05-08 | — | — | WO | claimed |
| US-20140120678-A1 | Methods for Selective and Conformal Epitaxy of Highly Doped Si-containing Materials for Three Dimensional Structures | MATHESON TRI-GAS (US) | 2014-05-01 | — | — | US | claimed |
| EP-2588650-A1 | SELECTIVE EPITAXY OF SI-CONTAINING MATERIALS AND SUBSTITUTIONALLY DOPED CRYSTALLINE SI-CONTAINING MATERIALS | Matheson Tri-Gas, Inc. (US) | 2013-05-08 | — | — | EP | claimed |
| US-8367548-B2 | Stable silicide films and methods for making the same | ASM AMERICA, INC. (US) | 2013-02-05 | — | — | US | claimed |
| US-20120003819-A1 | Methods and apparatus for selective epitaxy of si-containing materials and substitutionally doped crystalline si-containing material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-05 | — | — | US | claimed |
| WO-2012002994-A1 | SELECTIVE EPITAXY OF SI-CONTAINING MATERIALS AND SUBSTITUTIONALLY DOPED CRYSTALLINE SI-CONTAINING MATERIALS | MATHESON TRI-GAS, INC. (US) | 2012-01-05 | — | — | WO | claimed |
| US-20050064684-A1 | Process for deposition of semiconductor films | ASM IP HOLDING B.V. (NL) | 2005-03-24 | — | — | US | claimed |
| US-6821825-B2 | VAPOR DEPOSITION USING SILANE COMPOUND; UNIFORM THICKNESS | ASM AMERICA, INC. | 2004-11-23 | — | — | US | claimed |
| EP-1421607-A2 | IMPROVED PROCESS FOR DEPOSITION OF SEMICONDUCTOR FILMS | ASM America, Inc. (US) | 2004-05-26 | — | — | EP | claimed |
| WO-2002080244-A9 | IMPROVED PROCESS FOR DEPOSITION OF SEMICONDUCTOR FILMS | ASM INC (US) | 2004-04-22 | — | — | WO | claimed |
| EP-1374290-A2 | IMPROVED PROCESS FOR DEPOSITION OF SEMICONDUCTOR FILMS | ASM America, Inc. (US) | 2004-01-02 | — | — | EP | claimed |
| US-20030082300-A1 | Improved Process for Deposition of Semiconductor Films | ASM IP HOLDING B.V. (NL) | 2003-05-01 | — | — | US | claimed |
| US-20030022528-A1 | Improved Process for Deposition of Semiconductor Films | ASM IP HOLDING B.V. (NL) | 2003-01-30 | — | — | US | claimed |
| WO-2002080244-A2 | IMPROVED PROCESS FOR DEPOSITION OF SEMICONDUCTOR FILMS | ASM AMERICA, INC. (US) | 2002-10-10 | — | — | WO | claimed |
| WO-2002065516-A2 | IMPROVED PROCESS FOR DEPOSITION OF SEMICONDUCTOR FILMS | ASM AMERICA, INC. (US) | 2002-08-22 | — | — | WO | claimed |
| US-5399740-A | Tris(silyl)methanes and their preparation methods | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 1995-03-21 | — | — | US | claimed |