SCHEMBL3872276

SCHEMBL3872276

[SiH3]C(I)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23701031 0.61
SCHEMBL233695 0.61
SCHEMBL19658328 0.55
Iodoform SCHEMBL27906049 0.55
SCHEMBL1036689 0.55
Iodoform SCHEMBL28065163 0.55
Iodoform SCHEMBL28140705 0.55
SCHEMBL11831382 0.50
SCHEMBL1040196 0.50
SCHEMBL9451845 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12525449-B2 Method and apparatus for filling a gap ASM IP HOLDING B.V. (NL) 2026-01-13 US claimed
US-20250069948-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2025-02-27 US claimed
EP-4448831-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS Lam Research Corporation (US) 2024-10-23 EP claimed
CN-118434908-A Metal deposition in recessed features using halogen-containing deposition inhibitors 朗姆研究公司 2024-08-02 CN claimed
US-20230207309-A1 METHOD AND APPARATUS FOR FILLING A GAP ASM IP HOLDING B.V. (NL) 2023-06-29 US claimed
WO-2023114640-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2023-06-22 WO claimed
US-11610775-B2 Method and apparatus for filling a gap ASM IP HOLDING B.V. (NL) 2023-03-21 US claimed
US-20210313167-A1 METHOD AND APPARATUS FOR FILLING A GAP ASM IP HOLDING B.V. 2021-10-07 US claimed
CN-109690744-A Method and apparatus for filling gap ASM IP控股有限公司 2019-04-26 CN claimed
US-10179947-B2 Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition ASM IP HOLDING B.V. (NL) 2019-01-15 US claimed
US-9812320-B1 Method and apparatus for filling a gap ASM IP HOLDING B.V. (NL) 2017-11-07 US claimed
US-20150147483-A1 Method for Forming Conformal Nitrided, Oxidized, or Carbonized Dielectric Film by Atomic Layer Deposition ASM IP HOLDING B.V. (NL) 2015-05-28 US claimed
US-12525449-B2 Method and apparatus for filling a gap ASM IP HOLDING B.V. (NL) 2026-01-13 US disclosed
US-12371447-B2 Method for producing (meth)acryloxy group-containing organosilicon compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-29 US disclosed
US-20250069948-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2025-02-27 US disclosed
EP-4448831-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS Lam Research Corporation (US) 2024-10-23 EP disclosed
CN-101166529-A Benzotriazole derivatives as cannabinoid receptor antagonists JANSSEN PHARMACEUTICA NV (BE) 2008-04-23 CN disclosed
EP-1874304-A2 BENZOTRIAZOLE DERIVATIVES AS CANNABINOID RECEPTOR ANTAGONISTS JANSSEN PHARMACEUTICA N.V. (BE) 2008-01-09 EP disclosed
WO-2006117307-A2 BENZOTRIAZOLE DERIVATIVES AS CANNABINOID RECEPTOR ANTAGONISTS JANSSEN PHARMACEUTICA N.V. (BE) 2006-11-09 WO disclosed
US-5807922-A ORGANOSILANE DERIVATIZED LONG CHAIN OLEFINIC COMPOUND; INKS, COATINGS, ADHESIVES; ZERO VOLATILE ORGANIC COMPONENTS UNIVERSITY OF SOUTHERN MISSISSIPPI (US) 1998-09-15 US disclosed