SCHEMBL2337629

SCHEMBL2337629

CC(C)C(=O)OC(=O)C(=O)C(C)C.[Cu]

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
ELANE P08246 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4221918 1.00 TSHR (0.33) TSHRELANE
SCHEMBL2012306 0.97 TSHR (0.35) TSHRELANE
SCHEMBL1462514 0.85 TSHR (0.38) TSHR
SCHEMBL21571316 0.80
SCHEMBL8417265 0.79 SLC7A5 (0.41)
SCHEMBL16250 0.78 TSHR (0.42) TSHRELANE
SCHEMBL29159585 0.78 TSHR (0.47) TSHR
SCHEMBL28283173 0.78 TSHR (0.39) TSHRELANE
SCHEMBL7029457 0.76 TSHR (0.38) TSHR
SCHEMBL29118915 0.76 TSHR (0.33) TSHRELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8310054-B2 Semiconductor device manufacturing method and target substrate processing system TOKYO ELECTRON LIMITED (JP) 2012-11-13 US disclosed
US-20110265950-A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TARGET SUBSTRATE PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2011-11-03 US disclosed
US-8003535-B2 Semiconductor device manufacturing method and target substrate processing system TOKYO ELECTRON LIMITED (JP) 2011-08-23 US disclosed
US-20090042384-A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TARGET SUBSTRATE PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2009-02-12 US disclosed