⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5199129 | 0.83 | — | — | |
| Benzyl Alcohol SCHEMBL28607632 | 0.82 | TSHR (0.42) | — | |
| Ether SCHEMBL1638308 | 0.78 | — | — | |
| SCHEMBL28627132 | 0.75 | NQO1 (0.33) | — | |
| SCHEMBL1936436 | 0.74 | — | — | |
| Furan-2(5H)-One SCHEMBL1468144 | 0.74 | CA1 (0.59) | — | |
| SCHEMBL2992488 | 0.73 | CA1 (0.33) | — | |
| SCHEMBL28928064 | 0.73 | — | — | |
| SCHEMBL3689229 | 0.73 | GSK3A (0.50) | — | |
| SCHEMBL35885 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118318191-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-110537147-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-12 | — | — | CN | disclosed |
| WO-2024024502-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2024-02-01 | — | — | WO | disclosed |
| CN-110573963-B | Photosensitive resin composition | 日产化学株式会社 | 2023-10-24 | — | — | CN | disclosed |
| CN-116848466-A | Positive photosensitive resin composition | 日产化学株式会社 | 2023-10-03 | — | — | CN | disclosed |
| WO-2023140170-A1 | RING-FUSED THIOPHENE COMPOUND, AND COMPOSITION FOR WAVELENGTH CONVERSION FILM FORMATION USE WHICH CONTAINS SAME | 国立大学法人東海国立大学機構 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023100809-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-06-08 | — | — | WO | disclosed |
| CN-104737075-A | Photocurable composition | 3M INNOVATIVE PROPERTIES CO | 2015-06-24 | — | — | CN | disclosed |
| US-8969475-B2 | Method for preparing a modified ethylene-vinyl alcohol copolymer | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20140334066-A1 | SOLID ELECTROLYTE CAPACITOR AND A METHOD FOR MANUFACTURING THE SAME | TAYCA CORPORATION (JP) | 2014-11-13 | — | — | US | disclosed |
| US-20140211374-A1 | DISPERSION OF ELECTRICALLY CONDUCTIVE POLYMER, AND ELECTRICALLY CONDUCTIVE POLYMER AND USE THEREOF | TAYCA CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| US-20130123428-A1 | Method for Preparing a Modified Ethylene-Vinyl Alcohol Copolymer | The Yokohama Rubber Col, Ltd. (JP) | 2013-05-16 | — | — | US | disclosed |
| EP-2159234-B1 | Modified ethylene-vinyl alcohol copolymer, gas barrier resin, and molded article of the same | YOKOHAMA RUBBER CO LTD (JP) | 2011-08-24 | — | — | EP | disclosed |
| CN-1738711-B | Silica-containing layered structure and coating composition for forming porous silica layer | ASAHI KASEI FIBERS CORP | 2010-06-23 | — | — | CN | disclosed |
| EP-2159234-A1 | Modified ethylene-vinyl alcohol copolymer, gas barrier resin, and molded article of the same | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2010-03-03 | — | — | EP | disclosed |
| US-20100047586-A1 | MODIFIED ETHYLENE-VINYL ALCOHOL COPOLYMER, GAS BARRIER RESIN, AND MOLDED ARTICLE OF THE SAME | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| CN-1738711-A | Silica-containing layered structure and coating composition for forming porous silica layer | ASAHI CHEMICAL IND (JP) | 2006-02-22 | — | — | CN | disclosed |