⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Maleic Anhydride SCHEMBL228705 | 0.79 | MEN1 (0.33) | — | |
| SCHEMBL28928064 | 0.78 | — | — | |
| SCHEMBL2337812 | 0.78 | — | — | |
| SCHEMBL369085 | 0.76 | — | — | |
| SCHEMBL27235611 | 0.75 | — | — | |
| Benzoquinone SCHEMBL3656691 | 0.75 | ALDH1A1 (0.50) | — | |
| Benzoquinone SCHEMBL2464789 | 0.75 | ALDH1A1 (0.50) | — | |
| SCHEMBL28670922 | 0.72 | — | — | |
| Benzoquinone SCHEMBL11762015 | 0.70 | ALDH1A1 (0.44) | — | |
| SCHEMBL28520625 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1783548-B1 | Method of forming a patterned layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-03-08 | — | — | EP | disclosed |
| EP-1353228-B1 | Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method | ROHM & HAAS ELECT MAT (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8455175-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-06-04 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-20110262861-A1 | PHOTOSENSITIVE COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-10-27 | — | — | US | disclosed |
| US-7932016-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-04-26 | — | — | US | disclosed |
| US-7723850-B2 | Electronic devices having air gaps | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-05-25 | — | — | US | disclosed |
| EP-1510318-B1 | Process for manufacturing polymers | ROHM & HAAS (US) | 2009-07-01 | — | — | EP | disclosed |
| US-7344970-B2 | Plating method | SHIPLEY COMPANY, L.L.C. (US) | 2008-03-18 | — | — | US | disclosed |
| US-20080038518-A1 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2008-02-14 | — | — | US | disclosed |
| EP-1398831-A2 | Air gaps formation | Shipley Co. L.L.C. (US) | 2004-03-17 | — | — | EP | disclosed |
| US-20040018724-A1 | Plating method | SHIPLEY COMPANY, L.L.C (US) | 2004-01-29 | — | — | US | disclosed |
| EP-1353228-A1 | Method for depositing a very thick photoresist layer on a substrate and metal plating method | Shipley Co. L.L.C. (US) | 2003-10-15 | — | — | EP | disclosed |
| US-6384104-B1 | PROVIDING STORAGE STABILITY TO ULTRAVIOLET RADIATION ABSORPTION COMPOSITIONS BY ADDING LATEX POLYMER PARTICLES TO INCREASE ABSORPTION, WHEREIN PARTICLES CONTAIN VOID, HAVE SPECIFIED PARTICLE SIZE AND COMPRISE CROSSLINKED SHELL PORTION | ROHM AND HAAS COMPANY | 2002-05-07 | — | — | US | disclosed |
| CN-1293032-A | Method for preparing ultra-violet absorption composition | ROHM & HAAS (US) | 2001-05-02 | — | — | CN | disclosed |
| EP-1092421-A2 | Method for preparing ultraviolet radiation absorbing compositions | ROHM AND HAAS COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | disclosed |
| EP-0176356-B1 | PHOTOSENSITIVE POLYMER COMPOSITIONS, ELECTROPHORETIC DEPOSITION PROCESSES USING SAME, AND THE USE OF SAME IN FORMING FILMS ON SUBSTRATES | ROHM AND HAAS COMPANY (US) | 1988-11-02 | — | — | EP | disclosed |
| US-4592816-A | Forming negative images on conductive surfaces | ROHM AND HAAS COMPANY (US) | 1986-06-03 | — | — | US | disclosed |
| EP-0176356-A2 | Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates | ROHM AND HAAS COMPANY (US) | 1986-04-02 | — | — | EP | disclosed |