SCHEMBL233891

SCHEMBL233891

C=C[Si](C)(N(C)C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2025023 0.91
SCHEMBL15310142 0.82
SCHEMBL17717640 0.80
SCHEMBL2101405 0.78
SCHEMBL12504446 0.78
SCHEMBL610281 0.71
SCHEMBL26255372 0.71
SCHEMBL11331354 0.69 TSHR (0.35)
SCHEMBL706151 0.69
SCHEMBL713116 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 841 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4735933-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF Gvd Corporation (US) 2026-05-06 EP claimed
US-12584212-B2 Compositions and methods using same for germanium seed layer VERSUM MATERIALS US, LLC (US) 2026-03-24 US claimed
EP-4011921-B1 RUBBER WITH BACKBONE AND END-GROUP FUNCTIONALIZATION AND ITS METHOD OF MANUFACTURING AND USE IN A TIRE G 3 CHICKADEE PURCHASER LLC 1485 E ARCHWOOD AVENUE (US) 2026-02-04 EP claimed
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 US claimed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN claimed
WO-2025007115-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF GVD CORPORATION (US) 2025-01-02 WO claimed
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC 2023-09-14 US claimed
US-11649547-B2 Deposition of carbon doped silicon oxide VERSUM MATERIALS US, LLC (US) 2023-05-16 US claimed
CN-116113725-A Composition for germanium seed layer and method of using the same 弗萨姆材料美国有限责任公司 2023-05-12 CN claimed
EP-4176100-A1 COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER Versum Materials US, LLC (US) 2023-05-10 EP claimed
EP-2230287-A2 PRESSURE-SENSITIVE ADHESIVE COMPOSITIONS, POLARIZERS AND LIQUID CRYSTAL DISPLAYS COMPRISING THE SAME LG Chem, Ltd. (KR) 2010-09-22 EP claimed
WO-2010034004-A1 SYSTEMS, APPARATUS AND METHODS FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS AND/OR THERMAL CHEMICAL VAPOR DEPOSITION PROCESS BECTON, DICKINSON AND COMPANY (US) 2010-03-25 WO claimed
US-20090200166-A1 Method of Analyzing Hemoglobin by Capillary Eletrophoresis ARKRAY, INC. (JP) 2009-08-13 US claimed
EP-1046689-B1 Composition for a non-wettable transparent coating and coated articles CENTRE NAT ETD SPATIALES (FR) 2003-06-25 EP claimed
EP-1046689-A1 Composition for a non-wettable transparent coating and coated articles CENTRE NATIONAL D'ETUDES SPATIALES (FR) 2000-10-25 EP claimed
US-5958169-A Reactive ink compositions and systems TEKTRONIX, INC. (US) 1999-09-28 US claimed
EP-0604024-B1 Reactive ink compositions and system TEKTRONIX INC (US) 1999-01-27 EP claimed
US-5645888-A FOR PRINTING; APPLYING FIRST A PHASE CHANGE INK CARRIER AND CROSSLINKABLE CONSTITUENT AND THEN CROSSLINKING TEKTRONIX, INC. (US) 1997-07-08 US claimed
US-5380769-A Curable compositions TEKTRONIX INC. (US) 1995-01-10 US claimed
EP-0604024-A2 Reactive ink compositions and system TEKTRONIX, INC. (US) 1994-06-29 EP claimed