⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15310142 | 0.93 | — | — | |
| SCHEMBL15310141 | 0.80 | — | — | |
| SCHEMBL26255373 | 0.78 | — | — | |
| SCHEMBL705024 | 0.78 | — | — | |
| SCHEMBL25174536 | 0.74 | — | — | |
| SCHEMBL706712 | 0.74 | — | — | |
| SCHEMBL610285 | 0.74 | — | — | |
| SCHEMBL3108275 | 0.74 | — | — | |
| SCHEMBL2101405 | 0.74 | — | — | |
| SCHEMBL705536 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| EP-3902939-A1 | DEPOSITION OF CARBON DOPED SILICON OXIDE | Versum Materials US, LLC (US) | 2021-11-03 | — | — | EP | claimed |
| WO-2020163359-A1 | DEPOSITION OF CARBON DOPED SILICON OXIDE | VERSUM MATERIALS US, LLC (US) | 2020-08-13 | — | — | WO | claimed |
| EP-2463404-B1 | METHOD FOR FORMING SIO2 FILM | VERSUM MAT US LLC (US) | 2019-10-23 | — | — | EP | claimed |
| EP-2251899-B1 | Dielectric barrier deposition using nitrogen containing precursor | VERSUM MAT US LLC (US) | 2018-03-28 | — | — | EP | claimed |
| US-9460912-B2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-04 | — | — | US | claimed |
| US-8889235-B2 | Dielectric barrier deposition using nitrogen containing precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-11-18 | — | — | US | claimed |
| US-20140065844-A1 | Amino Vinylsilane Precursors for Stressed SiN Films | VERSUM MATERIALS US, LLC | 2014-03-06 | — | — | US | claimed |
| US-8460753-B2 | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-06-11 | — | — | US | claimed |
| EP-2192207-B1 | Method using amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films | AIR PROD & CHEM (US) | 2012-06-20 | — | — | EP | claimed |
| US-20100291321-A1 | Dielectric Barrier Deposition Using Nitrogen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-11-18 | — | — | US | claimed |
| EP-2251899-A1 | Dielectric barrier deposition using nitrogen containing precursor | Air Products and Chemicals, Inc. (US) | 2010-11-17 | — | — | EP | claimed |
| EP-4705309-A1 | CHLOROSILYL-SUBSTITUTED SILACYCLOALKANES AND THEIR USE FOR FORMATION OF FILMS COMPRISING SILICON AND OXYGEN | Versum Materials US, LLC (US) | 2026-03-11 | — | — | EP | disclosed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | disclosed |
| US-20250230301-A1 | RUBBER COMPOSITION FOR HEAVY-DUTY TIRES | ZEON CORPORATION (JP) | 2025-07-17 | — | — | US | disclosed |
| US-5189109-A | Acrylamide modified; impact strength; automobile tire | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-23 | — | — | US | disclosed |
| US-5128416-A | Automobile tire treads | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-07-07 | — | — | US | disclosed |
| EP-0493364-A2 | Modified diene polymer rubbers | Sumitomo Chemical Industries Ltd. (JP) | 1992-07-01 | — | — | EP | disclosed |
| EP-0334042-A2 | Modified diene polymer rubbers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-09-27 | — | — | EP | disclosed |