Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 4/20 | 0.52 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | CA12 | O43570 | 2/20 | 0.48 |
| ▸ | CA9 | Q16790 | 2/20 | 0.48 |
| ▸ | CA3 | P07451 | 1/20 | 0.48 |
| ▸ | CA6 | P23280 | 1/20 | 0.48 |
| ▸ | CA5A | P35218 | 1/20 | 0.48 |
| ▸ | CA7 | P43166 | 1/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.48 |
| ▸ | VDR | P11473 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | MMP1 | P03956 | 1/20 | 0.43 |
| ▸ | MMP2 | P08253 | 1/20 | 0.43 |
| ▸ | MMP9 | P14780 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5557903 | 1.00 | GAA (0.52) | GAATLR9CA2CA1CA12 | |
| SCHEMBL16344743 | 0.92 | TLR9 (0.45) | GAATLR9CA2CA1CA12 | |
| SCHEMBL14778368 | 0.91 | TLR9 (0.48) | GAATLR9CA2CA1CA12 | |
| SCHEMBL1629581 | 0.91 | TLR9 (0.48) | GAATLR9CA2CA1CA12 | |
| SCHEMBL14779302 | 0.90 | TLR9 (0.47) | GAATLR9CA2CA1CA12 | |
| SCHEMBL890642 | 0.89 | GAA (0.50) | GAATLR9CA2CA1CA12 | |
| SCHEMBL143705 | 0.89 | GAA (0.50) | GAATLR9CA2CA1CA12 | |
| SCHEMBL23249701 | 0.88 | TLR9 (0.45) | GAATLR9CA2CA1CA12 | |
| SCHEMBL10934289 | 0.88 | TLR9 (0.45) | GAATLR9CA2CA1CA12 | |
| SCHEMBL29224493 | 0.88 | AGER (0.46) | GAATLR9CA2CA1CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9240614-B2 | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES, LTD. (JP) | 2016-01-19 | — | — | US | claimed |
| EP-2579377-B1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | UBE INDUSTRIES (JP) | 2014-09-03 | — | — | EP | claimed |
| CN-122095297-A | Composition for forming cured film, alignment material, and phase difference material | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122029478-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20250257265-A1 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| CN-120051729-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-112602014-B | Method for producing liquid crystal alignment film, and liquid crystal display element | 日产化学株式会社 | 2025-02-11 | — | — | CN | disclosed |
| CN-112639595-B | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2025-01-10 | — | — | CN | disclosed |
| CN-119213355-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2024-12-27 | — | — | CN | disclosed |
| CN-119053661-A | Composition for forming cured film, alignment material, and retardation material | 日产化学株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-119053888-A | Resin composition for thermosetting photo-alignment film | 日产化学株式会社 | 2024-11-29 | — | — | CN | disclosed |
| EP-2579377-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | Ube Industries, Ltd. (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-20130071733-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | UBE INDUSTRIES, LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-20130071733-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | UBE INDUSTRIES, LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| EP-1813987-B1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-7595144-B2 | Sulfonate-containing anti-reflective coating forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-0110252-B1 | HEAT-SENSITIVE REGISTRATION MATERIAL | BASF Aktiengesellschaft (DE) | 1985-11-13 | — | — | EP | disclosed |
| EP-0110252-A2 | Heat-sensitive registration material | BASF Aktiengesellschaft (DE) | 1984-06-13 | — | — | EP | disclosed |