SCHEMBL2349703

SCHEMBL2349703

CCC(C)C(S)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8691833 1.00
SCHEMBL2353225 0.80 TDP1 (0.48)
SCHEMBL2872011 0.79
SCHEMBL8691016 0.77
SCHEMBL8691012 0.77
SCHEMBL28250562 0.77 ACE2 (0.48)
SCHEMBL28774300 0.75 GPR84 (0.50)
SCHEMBL9305795 0.74 TDP1 (0.50)
SCHEMBL24827776 0.72
SCHEMBL5371229 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12509609-B2 Curable resin composition, resin cured film, partition wall and optical element AGC Inc. (JP) 2025-12-30 US disclosed
US-20240392157-A1 CURABLE RESIN COMPOSITION, RESIN CURED FILM, PARTITION WALL AND OPTICAL ELEMENT AGC Inc. (JP) 2024-11-28 US disclosed
CN-118660924-A Curable resin composition, resin cured film, partition wall, and optical element AGC株式会社 2024-09-17 CN disclosed
WO-2023149406-A1 CURABLE RESIN COMPOSITION, RESIN CURED FILM, PARTITION WALL AND OPTICAL ELEMENT AGC株式会社 2023-08-10 WO disclosed
CN-111704689-B High-adhesion water-based vinylidene chloride copolymer emulsion for metal surface and preparation method thereof 天津城建大学 2022-04-26 CN disclosed
CN-109568166-B Fragrance materials 宝洁公司 2022-01-28 CN disclosed
CN-111704689-A High-adhesion water-based vinylidene chloride copolymer emulsion for metal surface and preparation method thereof 天津城建大学 2020-09-25 CN disclosed
CN-107936166-B Styrene-butadiene latex and preparation method thereof 杭州龙驹合成材料有限公司 2020-09-22 CN disclosed
CN-111518235-A Water-based vinylidene chloride copolymer resin and preparation method thereof 天津城建大学 2020-08-11 CN disclosed
US-20150011597-A1 DUAL-ACTING ANTIHYPERTENSIVE AGENTS THERAVANCE BIOPHARMA R&D IP, LLC. (US) 2015-01-08 US disclosed
US-20110237703-A1 PROCESS FOR PRODUCING PHOTOCURABLE MATERIAL, PHOTOCURABLE MATERIAL AND ARTICLE ASAHI GLASS COMPANY, LIMITED (JP) 2011-09-29 US disclosed
EP-2360195-A1 PHOTO-CURING MATERIAL MANUFACTURING METHOD, AND PHOTO-CURING MATERIAL AND ARTICLE Asahi Glass Company Limited (JP) 2011-08-24 EP disclosed
EP-2297113-A1 DUAL-ACTING ANTIHYPERTENSIVE AGENTS Theravance, Inc. (US) 2011-03-23 EP disclosed
US-20100267788-A1 DUAL-ACTING ANTIHYPERTENSIVE AGENTS THERAVANCE, INC. (US) 2010-10-21 US disclosed
US-7777077-B2 2-Mercaptomethyl-4-methylpentanoic Acid (2-Butyryl-[2'-(1H-tetrazol-5-yl)biphenyl-4-ylmethyl]aminoethyl)amide THERAVANCE, INC. (US) 2010-08-17 US disclosed
EP-2132187-A2 DUAL-ACTING ANTIHYPERTENSIVE AGENTS Theravance, Inc. (US) 2009-12-16 EP disclosed
WO-2009134741-A1 DUAL-ACTING ANTIHYPERTENSIVE AGENTS THERAVANCE, INC. (US) 2009-11-05 WO disclosed
US-20090270473-A1 DUAL-ACTING ANTIHYPERTENSIVE AGENTS THERAVANCE BIOPHARMA R&D IP, LLC 2009-10-29 US disclosed
WO-2008097459-A2 DUAL-ACTING ANTIHYPERTENSIVE AGENTS THERAVANCE, INC. (US) 2008-08-14 WO disclosed
US-20080188533-A1 2-Mercaptomethyl-4-methylpentanoic Acid (2-Butyryl-[2'-(1H-tetrazol-5-yl)biphenyl-4-ylmethyl]aminoethyl)amide THERAVANCE BIOPHARMA R&D IP, LLC 2008-08-07 US disclosed