SCHEMBL2353229

SCHEMBL2353229

C[CH][Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6054074 0.74
SCHEMBL6054013 0.74
SCHEMBL5700648 0.67
SCHEMBL2790030 0.67
Propene SCHEMBL29062320 0.63
Propene SCHEMBL28835048 0.60
SCHEMBL3693772 0.59
SCHEMBL177146 0.59
SCHEMBL3693775 0.59
SCHEMBL4231878 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9724669-B2 Modified hydrophobic sponges THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) 2017-08-08 US claimed
US-20160263552-A1 MODIFIED HYDROPHOBIC SPONGES THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) 2016-09-15 US claimed
US-20150367325-A1 MODIFIED HYDROPHOBIC SPONGES THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK 2015-12-24 US claimed
WO-2014127179-A1 MODIFIED HYDROPHOBIC SPONGES THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) 2014-08-21 WO claimed
EP-1918294-B1 Nanostructured Particles, Phase Change Inks Including Same and Methods for Making Same XEROX CORP (US) 2011-08-31 EP claimed
US-7786209-B2 Nanostructured particles, phase change inks including same and methods for making same XEROX CORPORATION (US) 2010-08-31 US claimed
EP-1918294-A1 Nanostructured Particles, Phase Change Inks Including Same and Methods for Making Same Xerox Corporation (US) 2008-05-07 EP claimed
US-20080103250-A1 NANOSTRUCTED PARTICLES, PHASE CHANGE INKS INCLUDING SAME AND METHODS FOR MAKING SAME XEROX CORPORATION (US) 2008-05-01 US claimed
US-6653365-B2 Polymerizable resin, a filler system comprising polyhedral polysilsesquioxane fillers, and a curing system; useful as crown and bridge materials, reconstructive or restorative materials PENTRON CLINICAL TECHNOLOGIES, LLC 2003-11-25 US claimed
US-6569932-B2 Reduced flammability; high strength; heat resistance THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NY 2003-05-27 US claimed
US-20020198282-A1 Dental composite materials and method of manufacture thereof PENTRON CORPORATION 2002-12-26 US claimed
US-20240010901-A1 Thermally Conductive Polymer Composition TICONA LLC 2024-01-11 US disclosed
US-11733609-B2 Silicon-containing underlayers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-08-22 US disclosed
WO-2023136990-A1 HIGH PERFORMANCE POLYMER COMPOSITION CONTAINING CARBON NANOSTRUCTURES TICONA LLC (US) 2023-07-20 WO disclosed
US-20230220182-A1 High Performance Polymer Composition Containing Carbon Nanostructures TICONA LLC 2023-07-13 US disclosed
US-20030018109-A1 Blends of organic silicon compounds with ethylene-based polymers THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NY 2003-01-23 US disclosed
US-20020198282-A1 Dental composite materials and method of manufacture thereof PENTRON CORPORATION 2002-12-26 US disclosed
US-5726336-A REACTING A BENZENE COMPOUND WITH A VINYLCHLOROSILANE COMPOUND IN THE PRESENCE OF A LEWIS ACID CATALYST; INTERMEDIATES FOR SILICONE POLYMERS USEFUL AS EMULSIONS, GREASES, ADHESIVES, SEALANTS, COATINGS, IN AUTOMOTIVE AND ENGINEERING FIELDS KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1998-03-10 US disclosed
EP-0393954-B1 A radiation-curable organopolysiloxane compound, method for the preparation thereof and method of forming a cured coating film SHINETSU CHEMICAL CO (JP) 1994-04-06 EP disclosed
US-4971831-A Novel radiation-curable organopolysiloxane compound and coating method SHIN-ETSU CHEMICAL CO., LTD. (JP) 1990-11-20 US disclosed