Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13720955 | 0.84 | CYP19A1 (0.33) | CYP19A1ATM | |
| SCHEMBL721442 | 0.75 | TDP1 (0.41) | CYP19A1 | |
| SCHEMBL2574552 | 0.73 | — | — | |
| SCHEMBL724731 | 0.72 | CYP19A1 (0.35) | CYP19A1ATMPOLBGRM1 | |
| SCHEMBL32688862 | 0.69 | ATM (0.42) | CYP19A1ATMPOLBGRM1 | |
| SCHEMBL18804149 | 0.68 | HCRTR2 (0.33) | — | |
| SCHEMBL236795 | 0.67 | NPC1 (0.35) | — | |
| SCHEMBL6432551 | 0.66 | ATM (0.38) | CYP19A1ATMPOLBGRM1 | |
| SCHEMBL6249963 | 0.66 | ATM (0.38) | CYP19A1ATMPOLBGRM1 | |
| SCHEMBL22507523 | 0.66 | GRM1 (0.39) | CYP19A1ATMPOLBGRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180120706-A1 | PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-9897922-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2018-02-20 | — | — | US | disclosed |
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9632222-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20160349620-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-9507257-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9482958-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2016-11-01 | — | — | US | disclosed |
| US-9442373-B2 | Method of producing color filter and solid-state imaging device having colored composition containing color agent | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9442374-B2 | Coloring composition, method for manufacturing a color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| EP-2486452-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM Corporation (JP) | 2012-08-15 | — | — | EP | disclosed |
| US-20120148957-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120028196-A1 | METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120003591-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110287234-A1 | NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2011-11-24 | — | — | US | disclosed |
| WO-2011132764-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-10-27 | — | — | WO | disclosed |
| WO-2011102546-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011087144-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-21 | — | — | WO | disclosed |
| WO-2011083872-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | WO | disclosed |
| WO-2011043481-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-04-14 | — | — | WO | disclosed |