⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8973176 | 0.91 | — | — | |
| SCHEMBL23537847 | 0.82 | — | — | |
| SCHEMBL3299850 | 0.67 | — | — | |
| SCHEMBL7130012 | 0.67 | — | — | |
| SCHEMBL6255498 | 0.67 | — | — | |
| SCHEMBL5177965 | 0.67 | — | — | |
| SCHEMBL297575 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL11761309 | 0.67 | — | — | |
| SCHEMBL11032703 | 0.67 | — | — | |
| SCHEMBL21670789 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 639 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4738518-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY USING SAME | Central Glass Company, Limited (JP) | 2026-05-06 | — | — | EP | claimed |
| EP-4738517-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | Central Glass Company, Limited (JP) | 2026-05-06 | — | — | EP | claimed |
| EP-4738519-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | Central Glass Company, Limited (JP) | 2026-05-06 | — | — | EP | claimed |
| EP-4735933-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | Gvd Corporation (US) | 2026-05-06 | — | — | EP | claimed |
| US-20260088359-A1 | ADDITIVE COMPOSITION AS WELL AS ELECT ROLYTIC SOLUTION AND BATTERY THEREOF | GUANGZHOU TINCI MATERIALS TECHNOLOGY CO., LTD. (CN) | 2026-03-26 | — | — | US | claimed |
| EP-4708439-A1 | ADDITIVE COMPOSITION, ELECTROLYTE COMPRISING SAME, AND BATTERY | Guangzhou Tinci Materials Technology Co., Ltd (CN) | 2026-03-11 | — | — | EP | claimed |
| CN-121586956-A | Nonaqueous electrolyte and nonaqueous electrolyte using the same nonaqueous electrolyte battery of aqueous electrolyte | 中央硝子株式会社 | 2026-02-27 | — | — | CN | claimed |
| CN-121586955-A | Nonaqueous electrolyte and nonaqueous electrolyte battery | 中央硝子株式会社 | 2026-02-27 | — | — | CN | claimed |
| EP-4664594-A1 | NON-AQUEOUS ELECTROLYTE AND NON-AQUEOUS ELECTROLYTE BATTERY | Central Glass Company, Limited (JP) | 2025-12-17 | — | — | EP | claimed |
| EP-4648166-A1 | NONAQUEOUS ELECTROLYTE, NONAQUEOUS ELECTROLYTE BATTERY, AND COMPOUND | Central Glass Company, Limited (JP) | 2025-11-12 | — | — | EP | claimed |
| EP-1300434-A2 | Hyperbranched polymers with latent functionality and methods of making same | Michigan Molecular Institute (US) | 2003-04-09 | — | — | EP | claimed |
| US-20020074086-A1 | Adhesive composition and optical device using the same | NIPPON SHEET GLASS CO., LTD. (JP) | 2002-06-20 | — | — | US | claimed |
| EP-0624262-B1 | METHOD OF APPLYING A LACQUER FILM SENSITIVE TO UV AND/OR ELECTRON-BEAM RADIATION | FRAUNHOFER GES FORSCHUNG (DE) | 1998-05-06 | — | — | EP | claimed |
| US-5585035-A | LIQUID CRYSTALS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-12-17 | — | — | US | claimed |
| US-5506008-A | Method of applying a lacquer film sensitive to ultraviolet and/or electron radiation | FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 1996-04-09 | — | — | US | claimed |
| EP-0624263-B1 | METHOD FOR THE DRY DEVELOPMENT OF A SILICON-CONTAINING LACQUER FILM SENSITIVE TO UV AND/OR ELECTRON-BEAM RADIATION | FRAUNHOFER GES FORSCHUNG (DE) | 1996-03-27 | — | — | EP | claimed |
| EP-0624262-A1 | METHOD OF APPLYING A LACQUER FILM SENSITIVE TO UV AND/OR ELECTRON-BEAM RADIATION | FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 1994-11-17 | — | — | EP | claimed |
| US-5256487-A | High char yield silazane derived preceramic polymers and cured compositions thereof | THE B. F. GOODRICH COMPANY (US) | 1993-10-26 | — | — | US | claimed |
| WO-1993015443-A1 | METHOD OF APPLYING A LACQUER FILM SENSITIVE TO UV AND/OR ELECTRON-BEAM RADIATION | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 1993-08-05 | — | — | WO | claimed |
| US-4560641-A | PLASMA POLYMERIZATION, PATTERNWISE EXPOSURE, AND DEVELOPMENT | HITACHI, LTD. (JP) | 1985-12-24 | — | — | US | claimed |