SCHEMBL8973176

SCHEMBL8973176

C=CC([SiH3])(C=C)C=C.C=C[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL235770 0.91
SCHEMBL23537847 0.74
SCHEMBL24432 0.71
Charcoal, Activated SCHEMBL2058858 0.66
Ethylene SCHEMBL22609094 0.66
Ethylene SCHEMBL1013493 0.66
SCHEMBL2062844 0.66
SCHEMBL2542980 0.66
SCHEMBL9267393 0.66
SCHEMBL10783431 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0624263-B1 METHOD FOR THE DRY DEVELOPMENT OF A SILICON-CONTAINING LACQUER FILM SENSITIVE TO UV AND/OR ELECTRON-BEAM RADIATION FRAUNHOFER GES FORSCHUNG (DE) 1996-03-27 EP claimed