SCHEMBL235810

SCHEMBL235810

C#CC(O)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2022763 0.83
SCHEMBL6142139 0.79
SCHEMBL27216865 0.79
SCHEMBL8980433 0.79
SCHEMBL487764 0.79 FDPS (0.31)
SCHEMBL10777069 0.77 FDPS (0.39)
SCHEMBL181367 0.75
SCHEMBL236785 0.75 FDPS (0.35)
SCHEMBL395580 0.72 TSHR (0.31)
SCHEMBL233642 0.71 FDPS (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 442 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120040779-A Azacyclo-carbene silver catalyst based on MOF framework and preparation method and application thereof 华南理工大学 2025-05-27 CN claimed
CN-119219673-A A kind of alloy containing [ Cu ]6I6Cluster lanthanide series microporous catalytic material, its preparation method and application in catalyzing CO2Use in the cyclization of carboxylic acids 洛阳师范学院 2024-12-31 CN claimed
CN-117160463-A Preparation method and application of cerium oxide supported copper-based catalyst 北京化工大学 2023-12-05 CN claimed
WO-2022114942-A1 OCTANE-INCREASING ADDITIVE FOR GASOLINE НАО "АТЫРАУСКИЙ УНИВЕРСИТЕТ НЕФТИ И ГАЗА ИМЕНИ С.УТЕБАЕВА" 2022-06-02 WO claimed
CN-113354511-B Synthesis method of gem-1, 3-eneyne compound 湖南第一师范学院 2022-03-25 CN claimed
US-11124746-B2 Post CMP cleaning composition ENTEGRIS, INC. (US) 2021-09-21 US claimed
CN-113354511-A Synthesis method of gem-1, 3-eneyne compound 湖南第一师范学院 2021-09-07 CN claimed
CN-112996893-A POST chemical mechanical polishing (POST CMP) cleaning composition 恩特格里斯公司 2021-06-18 CN claimed
US-10964541-B2 Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2021-03-30 US claimed
US-20200148979-A1 POST CMP CLEANING COMPOSITION MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT 2020-05-14 US claimed
US-20080166615-A1 COOLING LIQUID COMPOSITION FOR FUEL CELL SHISHIAI-KABUSHIKIGAISHA (JP) 2008-07-10 US claimed
US-20060145120-A1 Cooling liquid composition for fuel cell SHISHIAI-KABUSHIKIGAISHA (JP) 2006-07-06 US claimed
EP-1653544-A1 COOLING LIQUID COMPOSITION FOR FUEL CELL Shishiai-Kabushikigaisha (JP) 2006-05-03 EP claimed
EP-0882080-B1 WATER-DISPERSIBLE POLYMER AND COATING COMPOSITION CONTAINING THE SAME DEXTER CORP (US) 2001-07-11 EP claimed
US-5922817-A COATING WHICH PROVIDES CORROSION RESISTANCE TO A METAL SUBSTRATE AND EXHIBITS EXCELLENT FLEXIBILITY, CHEMICAL RESISTANCE AND ADHESION THE DEXTER CORPORATION (US) 1999-07-13 US claimed
US-5869552-A HAVING STRUCTURE WITH EPOXY PORTION LINKED TO ACRYLIC PORTION BY COMPOUND HAVING EITHER CONJUGATED DOUBLE BONDS OR TRIPLE BOND AND MOIETY CAPABLE OF REACTING WITH EPOXY GROUP THE DEXTER CORPORATION (US) 1999-02-09 US claimed
EP-0882080-A1 WATER-DISPERSIBLE POLYMER AND COATING COMPOSITION CONTAINING THE SAME THE DEXTER CORPORATION (US) 1998-12-09 EP claimed
US-5830952-A ACRYLIC POLYMERS LINKED TO EPOXY COMPOUNDS OR POLYMERS THE DEXTER CORPORATION (US) 1998-11-03 US claimed
WO-1997031044-A1 WATER-DISPERSIBLE POLYMER AND COATING COMPOSITION CONTAINING THE SAME THE DEXTER CORPORATION (US) 1997-08-28 WO claimed
US-4356325-A Process for preparation of acetylene terminated sulfones, oligomers and precursors therefor GULF RESEARCH & DEVELOPMENT COMPANY (US) 1982-10-26 US claimed