SCHEMBL2359708

SCHEMBL2359708

C=CC(=O)OCc1ccc(OCc2ccccc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ THRB P10828 1/20 0.58
▸ NR4A1 P22736 1/20 0.57
▸ NR4A2 P43354 1/20 0.57
▸ NR4A3 Q92570 1/20 0.57
▸ FFAR1 O14842 1/20 0.56
▸ FFAR4 Q5NUL3 1/20 0.56
▸ PTGS1 P23219 2/20 0.54
▸ PTGS2 P35354 2/20 0.54
▸ LMNA P02545 1/20 0.54
▸ CYP1A2 P05177 1/20 0.54
▸ SLC6A2 P23975 1/20 0.54
▸ CYP2C19 P33261 1/20 0.54
▸ SLC6A3 Q01959 1/20 0.54
▸ HIF1A Q16665 1/20 0.54
▸ HDAC6 Q9UBN7 1/20 0.54
▸ MAOB P27338 1/20 0.54
▸ PARP10 Q53GL7 1/20 0.54
▸ LTA4H P09960 1/20 0.53
▸ LAP3 P28838 1/20 0.53
▸ HCAR2 Q8TDS4 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28230354 0.88 HCAR2 (0.65) THRBLMNASLC6A2SLC6A3HCAR2
SCHEMBL34054 0.88 HCAR2 (0.65) THRBLMNASLC6A2SLC6A3HCAR2
Benzene SCHEMBL28307095 0.88 HCAR2 (0.65) THRBLMNASLC6A2SLC6A3HCAR2
SCHEMBL28010934 0.87 NR4A1 (0.60) THRBNR4A1NR4A2NR4A3FFAR1
Bicarbonate SCHEMBL3955752 0.87 HCAR2 (0.62) THRBLMNASLC6A2SLC6A3HCAR2
SCHEMBL11696680 0.87 HCAR2 (0.62) THRBLMNASLC6A2SLC6A3HCAR2
Bromide SCHEMBL28618019 0.87 HCAR2 (0.62) THRBLMNASLC6A2SLC6A3HCAR2
SCHEMBL8767252 0.87 HCAR2 (0.62) THRBLMNASLC6A2SLC6A3HCAR2
Ammonia Solution, Strong SCHEMBL11584311 0.87 HCAR2 (0.62) THRBLMNASLC6A2SLC6A3HCAR2
Hydrochloric Acid SCHEMBL28804358 0.87 HCAR2 (0.62) THRBLMNASLC6A2SLC6A3HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024106268-A1 CURABLE COMPOSITION, FILM FORMATION METHOD, PATTERN FORMATION METHOD, AND ARTICLE PRODUCTION METHOD キヤノン株式会社 2024-05-23 — — WO disclosed
US-9441065-B2 Curable composition for imprints, cured product and method for manufacturing a cured product FUJIFILM CORPORATION (JP) 2016-09-13 — — US disclosed
US-9441065-B2 Curable composition for imprints, cured product and method for manufacturing a cured product FUJIFILM CORPORATION (JP) 2016-09-13 — — US disclosed
US-9441065-B2 Curable composition for imprints, cured product and method for manufacturing a cured product FUJIFILM CORPORATION (JP) 2016-09-13 — — US disclosed
US-8999221-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2015-04-07 — — US disclosed
US-8999221-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2015-04-07 — — US disclosed
US-8999221-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2015-04-07 — — US disclosed
US-8883065-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2014-11-11 — — US disclosed
US-8883065-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2014-11-11 — — US disclosed
US-8883065-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2014-11-11 — — US disclosed
US-20140121292-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-05-01 — — US disclosed
US-20140121292-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-05-01 — — US disclosed
US-20110236595-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2011-09-29 — — US disclosed
US-20110236595-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2011-09-29 — — US disclosed
US-20110236595-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2011-09-29 — — US disclosed
EP-2352768-A2 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM Corporation (JP) 2011-08-10 — — EP disclosed
WO-2010064726-A2 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-06-10 — — WO disclosed
WO-2010064726-A2 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-06-10 — — WO disclosed
US-20060153929-A1 Use of solid phase synthesis to modify and to assemble nanoparticles INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 2006-07-13 — — US disclosed
EP-0361365-A1 Aminobenzoic and aminocyclohexane-carboylic acid compounds, compositions, and their method of use E.R. SQUIBB & SONS, INC. (US) 1990-04-04 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110236595-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN DNMT3L, DNMT3A, DNMT1 THRB 3880/4885NR4A1 2163/4885NR4A2 2777/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback