SCHEMBL23604682

SCHEMBL23604682

COc1cc(OC)c2c(c1)OC1(C=N2)N(C)c2ccc(C(=O)O)cc2C1(C)C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.48
MAPT P10636 5/20 0.48
LMNA P02545 5/20 0.48
THRB P10828 4/20 0.48
HPGD P15428 4/20 0.48
HTT P42858 4/20 0.48
SMN1; SMN2 Q16637 3/20 0.48
ALDH1A1 P00352 3/20 0.48
ALOX12 P18054 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
MAPK1 P28482 2/20 0.48
GAA P10253 2/20 0.48
POLB P06746 1/20 0.48
RECQL P46063 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
GFER P55789 2/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
PKM P14618 1/20 0.40
NPSR1 Q6W5P4 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20996957 0.88 MAPT (0.43) KDM4EMAPTLMNATHRBHPGD
SCHEMBL9226446 0.87 MAPT (0.58) KDM4EMAPTLMNATHRBHPGD
SCHEMBL23604680 0.87 MAPT (0.36) KDM4EMAPTLMNATHRBHPGD
SCHEMBL10428638 0.84 MAPT (0.51) KDM4EMAPTLMNATHRBHPGD
SCHEMBL23604692 0.76 MEN1 (0.34) KDM4EMAPTLMNATHRBHPGD
SCHEMBL9227991 0.75 MAPT (0.45) KDM4EMAPTLMNATHRBHPGD
SCHEMBL29565466 0.75 MAPT (0.48) KDM4EMAPTLMNATHRBHPGD
SCHEMBL23800767 0.75 MAPT (0.47) KDM4EMAPTLMNATHRBHPGD
SCHEMBL30369877 0.75 MAPT (0.47) KDM4EMAPTLMNATHRBHPGD
SCHEMBL9840851 0.75 MAPT (0.48) KDM4EMAPTLMNATHRBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11347148-B2 Patterning method and method for manufacturing array substrate BOE TECHNOLOGY GROUP CO., LTD. (CN) 2022-05-31 US disclosed
US-20210200090-A1 Patterning Method and Method for Manufacturing Array Substrate BOE TECHNOLOGY GROUP CO., LTD. (CN) 2021-07-01 US disclosed