Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.67 |
| ▸ | CDC25B | P30305 | 1/20 | 0.67 |
| ▸ | BCL2 | P10415 | 1/20 | 0.61 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.61 |
| ▸ | NPC1 | O15118 | 6/20 | 0.57 |
| ▸ | RAB9A | P51151 | 6/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.56 |
| ▸ | TP53 | P04637 | 3/20 | 0.56 |
| ▸ | CASP1 | P29466 | 2/20 | 0.56 |
| ▸ | CASP7 | P55210 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | DNMT1 | P26358 | 2/20 | 0.56 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.56 |
| ▸ | ELANE | P08246 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29867916 | 1.00 | MEN1 (0.67) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL30327427 | 1.00 | MEN1 (0.67) | MEN1KMT2ACDC25BBCL2MCL1 | |
| Hydrochloric Acid SCHEMBL10789329 | 0.97 | MEN1 (0.63) | MEN1KMT2ACDC25BBCL2MCL1 | |
| Hydrochloric Acid SCHEMBL10785532 | 0.97 | MEN1 (0.63) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL652915 | 0.95 | MEN1 (0.60) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL347152 | 0.95 | MEN1 (0.60) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL29440306 | 0.95 | MEN1 (0.60) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL29634247 | 0.95 | MEN1 (0.60) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL354514 | 0.94 | MEN1 (0.56) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL29364188 | 0.94 | MEN1 (0.56) | MEN1KMT2ACDC25BBCL2MCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2274 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240085670-A1 | METHODS OF MAKING A LOW-COST MINIATURE ACCOMMODATING OPTICAL IMAGING SYSTEM | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2024-03-14 | — | — | US | claimed |
| EP-3864002-B1 | ADDITION-FRAGMENTATION AGENT WITH PENDENT AMINE GROUPS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2023-12-27 | — | — | EP | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| US-20220033345-A1 | ADDITION-FRAGMENTATION AGENT WITH PENDENT AMINE GROUPS | 3M INNOVATIVE PROPERTIES COMPANY | 2022-02-03 | — | — | US | claimed |
| EP-3864002-A1 | ADDITION-FRAGMENTATION AGENT WITH PENDENT AMINE GROUPS | 3M Innovative Properties Company (US) | 2021-08-18 | — | — | EP | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-107077068-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 昭和电工材料株式会社 | 2021-03-12 | — | — | CN | claimed |
| EP-2855010-B1 | GRAFT COPOLYMER FUNCTIONALIZED ARTICLE | 3M INNOVATIVE PROPERTIES CO (US) | 2017-12-27 | — | — | EP | claimed |
| EP-1325324-A4 | IMPROVED ANTI-VIRAL AND ANTI-TUMOR CHEMOTHERAPY BY ADMINISTRATION OF ERYTHROPOEITIN | ORTHO MCNEIL PHARM INC (US) | 2004-11-10 | — | — | EP | claimed |
| EP-1325324-A1 | IMPROVED ANTI-VIRAL AND ANTI-TUMOR CHEMOTHERAPY BY ADMINISTRATION OF ERYTHROPOEITIN | Ortho-Mcneil Pharmaceutical, Inc. (US) | 2003-07-09 | — | — | EP | claimed |
| WO-1996040156-A1 | DIPHOSPHONATE DERIVATIVES OF THERAPEUTIC AGENTS | ELIZANOR BIOPHARMACEUTICALS, INC. (US) | 1996-12-19 | — | — | WO | claimed |
| US-5296046-A | Carrier solvent, sublimable oxide removing agent, compound that liberates nitrogen | MOTOROLA, INC. (US) | 1994-03-22 | — | — | US | claimed |
| US-5200513-A | Processes for producing doxorubicin, daunomycinone, and derivatives of doxorubicin | BOARD OF REGENTS, UNIVERSITY OF NEBRASKA-LINCOLN (US) | 1993-04-06 | — | — | US | claimed |
| EP-0523289-A1 | Processes for producing doxorubicin, daunomycinone, and derivatives of doxorubicin | Board of Regents of the University of Nebraska (US) | 1993-01-20 | — | — | EP | claimed |
| EP-0344112-B1 | SUBSTITUTED BISACYLOXYNAPHTHACENES, AND PROCESS FOR THE PREPARATION OF TETRATHIOTETRACENES | CIBA-GEIGY AG (CH) | 1993-01-20 | — | — | EP | claimed |
| EP-0344112-A2 | Substituted bisacyloxynaphthacenes, and process for the preparation of tetrathiotetracenes | CIBA-GEIGY AG (CH) | 1989-11-29 | — | — | EP | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |
| US-4167415-A | Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound | KANSAI PAINT CO., LTD. (JP) | 1979-09-11 | — | — | US | claimed |
| US-4092172-A | Photocurable composition comprising a copolymer of a maleic acid monoester with an α-olefine | KANSAI PAINT CO., LTD. (JA) | 1978-05-30 | — | — | US | claimed |
| US-3941759-A | A QUINONE PHOTOSENSITIZER AND A TRANSITION METAL DIALKYL-DITHIOCARBAMATE | OWENS-ILLINOIS, INC. (US) | 1976-03-02 | — | — | US | claimed |