SCHEMBL29634247

SCHEMBL29634247

O=C1c2ccccc2-c2cc3ccccc3cc21

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.60
KMT2A Q03164 4/20 0.60
CDC25B P30305 1/20 0.60
CYP3A4 P08684 3/20 0.58
CASP1 P29466 2/20 0.58
CASP7 P55210 2/20 0.58
DNMT1 P26358 2/20 0.58
PABPC1 P11940 1/20 0.58
NPC1 O15118 7/20 0.57
RAB9A P51151 7/20 0.57
MAPK1 P28482 5/20 0.57
SMN1; SMN2 Q16637 5/20 0.57
PTPRC P08575 4/20 0.57
LMNA P02545 4/20 0.57
S100A4 P26447 3/20 0.57
APAF1 O14727 3/20 0.57
HTT P42858 3/20 0.57
GALK1 P51570 3/20 0.57
BLM P54132 3/20 0.57
NPSR1 Q6W5P4 3/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL347152 1.00 MEN1 (0.60) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL29440306 1.00 MEN1 (0.60) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL2198881 0.95 PTPRC (0.65) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL236156 0.95 MEN1 (0.67) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL29867916 0.95 MEN1 (0.67) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL30327427 0.95 MEN1 (0.67) MEN1KMT2ACDC25BCYP3A4CASP1
Hydrochloric Acid SCHEMBL10789329 0.92 MEN1 (0.63) MEN1KMT2ACDC25BCYP3A4CASP1
Hydrochloric Acid SCHEMBL10785532 0.92 MEN1 (0.63) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL16144676 0.92 MEN1 (0.53) MEN1KMT2ACDC25BCYP3A4CASP1
SCHEMBL29634145 0.92 MEN1 (0.53) MEN1KMT2ACDC25BCYP3A4CASP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118598742-A Methyl ketone-carboxylic acid conversion reaction method under non-oxidation condition 贵州医科大学 2024-09-06 CN claimed
US-20250368828-A1 Process for Producing Carbon Blacks with Reduced Content of Oxy-Polycyclic Aromatic Hydrocarbons (Oxy-PAHS) Utilizing Supercritical Fluid Extraction ORION ENG CARBONS IP GMBH & CO KG (DE) 2025-12-04 US disclosed
WO-2025124901-A1 PROCESS FOR PRODUCING PURIFIED CARBON BLACKS WITH REDUCED CONTENT OF OXIDIZED POLYCYCLIC AROMATIC HYDROCARBONS ORION ENGINEERED CARBONS IP GMBH & CO. KG (DE) 2025-06-19 WO disclosed
WO-2025127121-A1 FLEXIBLE DEVICE SUBSTRATE-FORMING COMPOSITION 日産化学株式会社 2025-06-19 WO disclosed
WO-2025098667-A1 ALKALINE CARBON BLACK, PREPARATION THEREOF AND COMPOSITIONS AND ARTICLES CONTAINING THE SAME ORION ENGINEERED CARBONS IP GMBH & CO. KG (DE) 2025-05-15 WO disclosed
CN-116096700-B Carboxylic acid or carboxylic ester compound having condensed ring structure, process for producing the same, and use of the compound 富士胶片株式会社 2025-05-13 CN disclosed
CN-113582856-B Organic electroluminescent compound and organic electroluminescent device comprising the same 杜邦特种材料韩国有限公司 2025-03-07 CN disclosed
CN-119452045-A Method for producing carbon black with reduced content of oxygen-containing polycyclic aromatic hydrocarbon (oxygen-containing PAH) by supercritical fluid extraction 欧励隆工程炭知识产权有限两合公司 2025-02-14 CN disclosed
CN-116097129-B Compound, curable resin composition, cured product, optical component, and lens 富士胶片株式会社 2024-10-11 CN disclosed
CN-118598742-A Methyl ketone-carboxylic acid conversion reaction method under non-oxidation condition 贵州医科大学 2024-09-06 CN disclosed
CN-117321502-A Composition for forming resist underlayer film 日产化学株式会社 2023-12-29 CN disclosed
CN-116097129-A Compound, curable resin composition, cured product, optical component, and lens 富士胶片株式会社 2023-05-09 CN disclosed
CN-116096700-A Carboxylic acid or carboxylic ester compound having condensed ring structure, process for producing the same, and use of the compound 富士胶片株式会社 2023-05-09 CN disclosed
CN-115136074-A Composition for forming resist underlayer film 日产化学株式会社 2022-09-30 CN disclosed
CN-111290216-B Hard mask composition, hard mask and method for forming pattern 厦门恒坤新材料科技股份有限公司 2022-05-20 CN disclosed