SCHEMBL23686307

SCHEMBL23686307

CC(=O)Oc1ccc(C(C)(C)C(C)C)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 4/20 0.52
▸ MAPT P10636 5/20 0.47
▸ POLB P06746 1/20 0.47
▸ PKM P14618 1/20 0.47
▸ ELANE P08246 6/20 0.46
▸ HSD17B10 Q99714 1/20 0.44
▸ KMT2A Q03164 3/20 0.44
▸ MEN1 O00255 2/20 0.44
▸ ALDH1A1 P00352 1/20 0.43
▸ HSP90AA1 P07900 1/20 0.43
▸ GAA P10253 1/20 0.43
▸ CYP3A4 P08684 2/20 0.42
▸ KDM4E B2RXH2 1/20 0.42
▸ TTR P02766 1/20 0.42
▸ TP53 P04637 1/20 0.42
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ TDP1 Q9NUW8 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ GLA P06280 1/20 0.41
▸ ESR1 P03372 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL337701 0.80 MAPT (0.59) LMNAMAPTPOLBPKMELANE
SCHEMBL10629411 0.80 LMNA (0.59) LMNAMAPTPOLBPKMELANE
SCHEMBL5491320 0.80 LMNA (0.59) LMNAMAPTPOLBPKMELANE
SCHEMBL1507621 0.80 LMNA (0.59) LMNAMAPTPOLBPKMELANE
Ammonia Solution, Strong SCHEMBL22832179 0.79 MAPT (0.58) LMNAMAPTPOLBPKMELANE
SCHEMBL11422436 0.79 LMNA (0.57) LMNAMAPTPOLBPKMELANE
SCHEMBL13713513 0.78 LMNA (0.52) LMNAMAPTPOLBPKMELANE
SCHEMBL12352732 0.77 POLB (0.47) LMNAMAPTPOLBPKMELANE
SCHEMBL269329 0.77 LMNA (0.80) LMNAMAPTPOLBPKMELANE
SCHEMBL17358715 0.76 LMNA (0.59) LMNAMAPTPOLBPKMELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11780946-B2 Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-10 — — US disclosed
US-20210230332-A1 ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, METHOD OF PRODUCING POLYMERIC COMPOUND, AND METHOD OF FORMING RESIST PATTERN NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2021-07-29 — — US disclosed
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