SCHEMBL236922

SCHEMBL236922

CCCCCCCCCCCCCCCCCCN(CCCC)CCCCCCCCCCCCCCCCCC

nearest known ligand 0.58

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 5/20 0.58
TSHR P16473 1/20 0.53
THRB P10828 1/20 0.53
KDM5A P29375 3/20 0.48
PHF8 Q9UPP1 2/20 0.48
KDM4C Q9H3R0 1/20 0.48
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA9 Q16790 1/20 0.44
KCNH2 Q12809 1/20 0.43
GBA1 P04062 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9807773 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL628762 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL10606558 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL1003342 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL516699 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL24028136 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL14840251 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL2945945 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL21409651 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8
SCHEMBL4891747 1.00 DNM1 (0.58) DNM1TSHRTHRBKDM5APHF8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3031834-B1 PROPYLENE-BASED ELASTOMER LG CHEMICAL LTD (KR) 2018-01-31 EP disclosed
US-9745406-B2 Curable composition CEMEDINE CO., LTD. (JP) 2017-08-29 US disclosed
EP-2412756-B1 CURABLE COMPOSITION CEMEDINE CO LTD (JP) 2016-12-21 EP disclosed
US-8519049-B2 Curable composition CEMEDINE CO., LTD. (JP) 2013-08-27 US disclosed
US-20120316253-A1 CURABLE COMPOSITION SAITO ATSUSHI (JP) 2012-12-13 US disclosed
EP-2450384-A2 METHOD FOR PRODUCING AN ELASTOMER USING A TRANSITION METAL CATALYST LG Chem, Ltd. (KR) 2012-05-09 EP disclosed
EP-2412756-A1 CURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2012-02-01 EP disclosed
US-20120004371-A1 CURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2012-01-05 US disclosed
US-20090118401-A1 Curable Composition CEMEDINE CO., LTD. (JP) 2009-05-07 US disclosed
US-7438404-B2 Ink-jet recording ink and image-forming method FUJIFILM CORPORATION (JP) 2008-10-21 US disclosed
EP-0541074-A2 Non-pollution sealant compound SUNRISE MEISEI CORPORATION (JP) 1993-05-12 EP disclosed
US-4699627-A SECONDARY, TERTIARY AND QUATERNARY DYE-RETAINING COMPOUNDS ON FIBER SURFACE; COLORFAST AKZONA INCORPORATED (US) 1987-10-13 US disclosed