⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2379668 | 1.00 | — | — | |
| SCHEMBL9509929 | 0.67 | — | — | |
| SCHEMBL9509932 | 0.67 | — | — | |
| SCHEMBL19509996 | 0.67 | — | — | |
| SCHEMBL30075932 | 0.65 | — | — | |
| SCHEMBL20605353 | 0.65 | — | — | |
| SCHEMBL5986869 | 0.62 | — | — | |
| SCHEMBL10400205 | 0.62 | — | — | |
| SCHEMBL12131649 | 0.62 | — | — | |
| SCHEMBL10400204 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060169391-A1 | Tire compositions and vulcanizates thereof having improved silica reinforcement | BRIDGESTONE CORPORATION (JP) | 2006-08-03 | — | — | US | claimed |
| US-5273783-A | Chemical vapor deposition of titanium and titanium containing films using bis (2,4-dimethylpentadienyl) titanium as a precursor | MICRON SEMICONDUCTOR, INC. (US) | 1993-12-28 | — | — | US | claimed |
| EP-2259303-B1 | Interfacial capping layers for interconnects | NOVELLUS SYSTEMS INC (US) | 2018-09-19 | — | — | EP | disclosed |
| US-20140216336-A1 | METAL AND SILICON CONTAINING CAPPING LAYERS FOR INTERCONNECTS | NOVELLUS SYSTEMS, INC. (US) | 2014-08-07 | — | — | US | disclosed |
| US-8753978-B2 | Metal and silicon containing capping layers for interconnects | NOVELLUS SYSTEMS, INC. (US) | 2014-06-17 | — | — | US | disclosed |
| US-20130143401-A1 | METAL AND SILICON CONTAINING CAPPING LAYERS FOR INTERCONNECTS | NOVELLUS SYSTEMS, INC. | 2013-06-06 | — | — | US | disclosed |
| WO-2012167141-A2 | METAL AND SILICON CONTAINING CAPPING LAYERS FOR INTERCONNECTS | NOVELLUS SYSTEMS, INC. (US) | 2012-12-06 | — | — | WO | disclosed |
| US-8268722-B2 | Interfacial capping layers for interconnects | NOVELLUS SYSTEMS, INC. (US) | 2012-09-18 | — | — | US | disclosed |
| US-8017696-B2 | Tire compositions and vulcanizates thereof having improved silica reinforcement | BRIDGESTONE CORPORATION (JP) | 2011-09-13 | — | — | US | disclosed |
| US-20100308463-A1 | INTERFACIAL CAPPING LAYERS FOR INTERCONNECTS | NOVELLUS SYSTEMS, INC. | 2010-12-09 | — | — | US | disclosed |
| EP-2259303-A2 | Interfacial capping layers for interconnects | Novellus Systems, Inc. (US) | 2010-12-08 | — | — | EP | disclosed |
| EP-0819706-A1 | Process for the syndiotactic propagation of olefins | FINA TECHNOLOGY, INC. (US) | 1998-01-21 | — | — | EP | disclosed |
| US-5693377-A | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds | MICRON TECHNOLOGY, INC. (US) | 1997-12-02 | — | — | US | disclosed |
| US-5693377-A | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds | MICRON TECHNOLOGY, INC. (US) | 1997-12-02 | — | — | US | disclosed |
| WO-1996018660-A1 | HYDROGENATION OF UNSATURATED POLYMERS USING DIVALENT NON-AROMATIC ANIONIC DIENYL-CONTAINING GROUP IV METAL CATALYSTS | THE DOW CHEMICAL COMPANY (US) | 1996-06-20 | — | — | WO | disclosed |
| WO-1996016094-A1 | PREPARATION OF SYNDIOTACTIC POLYOLEFINS FROM PROCHIRAL OLEFINS | THE DOW CHEMICAL COMPANY (US) | 1996-05-30 | — | — | WO | disclosed |
| EP-0711846-A1 | Titanium nitride deposited by chemical vapor deposition | APPLIED MATERIALS, INC. (US) | 1996-05-15 | — | — | EP | disclosed |
| US-5273783-A | Chemical vapor deposition of titanium and titanium containing films using bis (2,4-dimethylpentadienyl) titanium as a precursor | MICRON SEMICONDUCTOR, INC. (US) | 1993-12-28 | — | — | US | disclosed |
| US-5200379-A | Activating inorganic refractory by calcining in air, then contacting with catalyst complex to absorb catalyst onto refractory support | PHILLIPS PETROLEUM COMPANY (US) | 1993-04-06 | — | — | US | disclosed |
| US-5075394-A | Controlling physical properties of polyolefins with catalyst | PHILLIPS PETROLEUM COMPANY (US) | 1991-12-24 | — | — | US | disclosed |