SCHEMBL2379668

SCHEMBL2379668

CC(C)=CC(C)=C[Ti]C=C(C)C=C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2379667 1.00
SCHEMBL9509929 0.67
SCHEMBL9509932 0.67
SCHEMBL19509996 0.67
SCHEMBL30075932 0.65
SCHEMBL20605353 0.65
SCHEMBL5986869 0.62
SCHEMBL10400205 0.62
SCHEMBL12131649 0.62
SCHEMBL10400204 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1841603-B1 Method for preparing a tire having improved silica reinforcement BRIDGESTONE CORP (JP) 2009-11-25 EP claimed
EP-1841603-A2 TIRE COMPOSITIONS AND VULCANIZATES THEREOF HAVING IMPROVED SILICA REINFORCEMENT Bridgestone Corporation (JP) 2007-10-10 EP claimed
US-20070045856-A1 Mixed metal nitride and boride barrier layers VAARTSTRA BRIAN A 2007-03-01 US claimed
US-7101779-B2 Method of forming barrier layers MICRON, TECHNOLOGY, INC. (US) 2006-09-05 US claimed
US-20060169391-A1 Tire compositions and vulcanizates thereof having improved silica reinforcement BRIDGESTONE CORPORATION (JP) 2006-08-03 US claimed
WO-2006076670-A2 TIRE COMPOSITIONS AND VULCANIZATES THEREOF HAVING IMPROVED SILICA REINFORCEMENT BRIDGESTONE CORPORATION (JP) 2006-07-20 WO claimed
US-20040053495-A1 Method of forming barrier layers MICRON TECHNOLOGY, INC. 2004-03-18 US claimed
US-20020163025-A1 Mixed metal nitride and boride barrier layers MICRON SEMICONDUCTOR PRODUCTS, INC. 2002-11-07 US claimed
US-5273783-A Chemical vapor deposition of titanium and titanium containing films using bis (2,4-dimethylpentadienyl) titanium as a precursor MICRON SEMICONDUCTOR, INC. (US) 1993-12-28 US claimed
US-5200379-A Activating inorganic refractory by calcining in air, then contacting with catalyst complex to absorb catalyst onto refractory support PHILLIPS PETROLEUM COMPANY (US) 1993-04-06 US claimed
US-5075394-A Controlling physical properties of polyolefins with catalyst PHILLIPS PETROLEUM COMPANY (US) 1991-12-24 US claimed
EP-2259303-B1 Interfacial capping layers for interconnects NOVELLUS SYSTEMS INC (US) 2018-09-19 EP disclosed
US-20140216336-A1 METAL AND SILICON CONTAINING CAPPING LAYERS FOR INTERCONNECTS NOVELLUS SYSTEMS, INC. (US) 2014-08-07 US disclosed
US-8753978-B2 Metal and silicon containing capping layers for interconnects NOVELLUS SYSTEMS, INC. (US) 2014-06-17 US disclosed
US-20130143401-A1 METAL AND SILICON CONTAINING CAPPING LAYERS FOR INTERCONNECTS NOVELLUS SYSTEMS, INC. 2013-06-06 US disclosed
US-5273783-A Chemical vapor deposition of titanium and titanium containing films using bis (2,4-dimethylpentadienyl) titanium as a precursor MICRON SEMICONDUCTOR, INC. (US) 1993-12-28 US disclosed
US-5273783-A Chemical vapor deposition of titanium and titanium containing films using bis (2,4-dimethylpentadienyl) titanium as a precursor MICRON SEMICONDUCTOR, INC. (US) 1993-12-28 US disclosed
US-5273783-A Chemical vapor deposition of titanium and titanium containing films using bis (2,4-dimethylpentadienyl) titanium as a precursor MICRON SEMICONDUCTOR, INC. (US) 1993-12-28 US disclosed
US-5200379-A Activating inorganic refractory by calcining in air, then contacting with catalyst complex to absorb catalyst onto refractory support PHILLIPS PETROLEUM COMPANY (US) 1993-04-06 US disclosed
US-5075394-A Controlling physical properties of polyolefins with catalyst PHILLIPS PETROLEUM COMPANY (US) 1991-12-24 US disclosed