⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbon Monoxide SCHEMBL1252779 | 0.94 | — | — | |
| SCHEMBL6277205 | 0.73 | — | — | |
| SCHEMBL6906690 | 0.73 | — | — | |
| SCHEMBL27885671 | 0.71 | — | — | |
| SCHEMBL10633389 | 0.71 | — | — | |
| SCHEMBL1373408 | 0.71 | — | — | |
| SCHEMBL9170345 | 0.71 | — | — | |
| SCHEMBL20261882 | 0.71 | — | — | |
| Carbon Monoxide SCHEMBL1132623 | 0.71 | — | — | |
| SCHEMBL9745269 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9293417-B2 | Method for forming barrier film on wiring line | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| US-8531033-B2 | Contact plug structure, semiconductor device, and method for forming contact plug | ADVANCED INTERCONNECT MATERIALS, LLC (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8349725-B2 | Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and storage medium | TOKYO ELECTRON LIMITED (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8247321-B2 | Method of manufacturing semiconductor device, semiconductor device, electronic instrument, semiconductor manufacturing apparatus, and storage medium | TOKYO ELECTRON LIMITED (JP) | 2012-08-21 | — | — | US | disclosed |
| US-20120114869-A1 | FILM FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20110237066-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND STORAGE MEDIUM | TOKYO ELECTRON LIMITED (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110049718-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, ELECTRONIC INSTRUMENT, SEMICONDUCTOR MANUFACTURING APPARATUS, AND STORAGE MEDIUM | TOKYO ELECTRON LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |