⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14480150 | 0.65 | — | — | |
| SCHEMBL25283394 | 0.60 | — | — | |
| SCHEMBL15061553 | 0.56 | — | — | |
| SCHEMBL8466599 | 0.54 | — | — | |
| SCHEMBL7830012 | 0.53 | — | — | |
| SCHEMBL6414668 | 0.53 | — | — | |
| SCHEMBL23069114 | 0.50 | ALDH1A1 (0.33) | — | |
| SCHEMBL23069112 | 0.50 | ALDH1A1 (0.33) | — | |
| SCHEMBL17729856 | 0.50 | — | — | |
| SCHEMBL83084 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230045851-A1 | METHOD FOR PRODUCING RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2023-02-16 | — | — | US | disclosed |
| US-20230043143-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |
| US-20210286264-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |