SCHEMBL23809795

SCHEMBL23809795

CC(C)(CI)C(=O)OC1(C)C2CC3CC(C2)CC1C3

nearest known ligand 0.47

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.47
CYP19A1 P11511 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47397 0.85 CYP19A1 (0.48) CYP17A1CYP19A1
SCHEMBL17449450 0.83 CYP17A1 (0.46) CYP17A1CYP19A1
SCHEMBL13232361 0.81 CYP17A1 (0.52) CYP17A1CYP19A1
SCHEMBL14750837 0.80 CYP17A1 (0.44) CYP17A1CYP19A1
SCHEMBL18400996 0.79 CYP17A1 (0.46) CYP17A1CYP19A1
SCHEMBL12603697 0.79 CYP17A1 (0.48) CYP17A1CYP19A1
SCHEMBL686024 0.78 CYP17A1 (0.50) CYP17A1CYP19A1
SCHEMBL14253569 0.78 CYP17A1 (0.43) CYP17A1CYP19A1
SCHEMBL11985995 0.78 CYP17A1 (0.43) CYP17A1CYP19A1
SCHEMBL17281194 0.78 CYP17A1 (0.43) CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210286264-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-09-16 US disclosed