Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.57 |
| ▸ | CA2 | P00918 | 3/20 | 0.57 |
| ▸ | CA7 | P43166 | 2/20 | 0.57 |
| ▸ | CA9 | Q16790 | 2/20 | 0.57 |
| ▸ | CA12 | O43570 | 1/20 | 0.57 |
| ▸ | CA4 | P22748 | 1/20 | 0.57 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.57 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.53 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.53 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.53 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.53 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.53 |
| ▸ | TP53 | P04637 | 2/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | ACHE | P22303 | 1/20 | 0.51 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18550495 | 0.88 | ALDH1A1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL24631622 | 0.88 | CHRM2 (0.45) | CA1CA2CA7CA9CA12 | |
| SCHEMBL7259231 | 0.87 | CA1 (0.60) | CA1CA2CA7CA9CA12 | |
| SCHEMBL30273872 | 0.87 | IDO1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL30986735 | 0.87 | IDO1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL30476555 | 0.87 | IDO1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL477540 | 0.87 | IDO1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL3862578 | 0.87 | IDO1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL6003036 | 0.87 | CA1 (0.48) | CA1CA2CA7CA9CA12 | |
| SCHEMBL23084671 | 0.85 | CA1 (0.57) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960926-B1 | METHOD OF FORMING RESIST PATTERN | UNIV OSAKA (JP) | 2019-05-29 | — | — | EP | claimed |
| US-4254247-A | COMPLEXES OF METAL AMIDE AND METAL ALCOHOLATE | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-03-03 | — | — | US | claimed |
| US-4243787-A | Bulk anionic polymerization process using an alkali metal amide and the salt of the same alkali metal with a hydroxylic compound | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-01-06 | — | — | US | claimed |
| EP-0002159-A1 | Process for anionic mass polymerisation with an alcali-metal azide and a hydroxylate of the same metal | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1979-05-30 | — | — | EP | claimed |
| US-11796919-B2 | Resist pattern formation method | OSAKA UNIVERSITY (JP) | 2023-10-24 | — | — | US | disclosed |
| CN-111562720-B | Photo-sensitized chemically amplified resist material, pattern forming method, semiconductor device, mask for lithography, and template for nanoimprint | 东京毅力科创株式会社 | 2023-09-29 | — | — | CN | disclosed |
| CN-113816837-B | Synthesis method of 4,4' -dimethoxy triphenylchloromethane | 连云港冠昕医药科技有限公司 | 2023-09-19 | — | — | CN | disclosed |
| US-20210216016-A1 | RESIST PATTERN FORMATION METHOD | OSAKA UNIVERSITY (JP) | 2021-07-15 | — | — | US | disclosed |
| EP-3809206-A1 | RESIST PATTERN FORMATION METHOD | Osaka University (JP) | 2021-04-21 | — | — | EP | disclosed |
| CN-112272798-A | Resist pattern forming method | 国立大学法人大阪大学 | 2021-01-26 | — | — | CN | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-4399133-A | ADMINISTERING, INFECTIONS | FUJISAWA PHARMACEUTICAL COMPANY, LIMITED (JP) | 1983-08-16 | — | — | US | disclosed |
| US-4393059-A | BACTERICIDAL CEPHALOSPORINS | FUJISAWA PHARMACEUTICAL COMPANY, LIMITED (JP) | 1983-07-12 | — | — | US | disclosed |
| US-4316001-A | Anionic polymerization of heterocyclic monomers with alkali metal amide hydroxylated compound initiator | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1982-02-16 | — | — | US | disclosed |
| US-4294960-A | 7-[2-(2-Aminothiazol-4-yl)-2-cyclopentyloxyiminoacetamido]-3-cephem-4-carboxylic acid (synisomer) | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1981-10-13 | — | — | US | disclosed |
| EP-0002159-B1 | PROCESS FOR ANIONIC MASS POLYMERISATION WITH AN ALCALI-METAL AZIDE AND A HYDROXYLATE OF THE SAME METAL | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-09-16 | — | — | EP | disclosed |
| US-4254247-A | COMPLEXES OF METAL AMIDE AND METAL ALCOHOLATE | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-03-03 | — | — | US | disclosed |
| US-4243787-A | Bulk anionic polymerization process using an alkali metal amide and the salt of the same alkali metal with a hydroxylic compound | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-01-06 | — | — | US | disclosed |
| EP-0002159-A1 | Process for anionic mass polymerisation with an alcali-metal azide and a hydroxylate of the same metal | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1979-05-30 | — | — | EP | disclosed |