⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL730658 | 0.74 | — | — | |
| SCHEMBL31316965 | 0.69 | — | — | |
| SCHEMBL11910508 | 0.65 | — | — | |
| SCHEMBL8460473 | 0.65 | — | — | |
| SCHEMBL8050292 | 0.63 | — | — | |
| SCHEMBL9563643 | 0.63 | — | — | |
| SCHEMBL2362602 | 0.63 | — | — | |
| SCHEMBL21799209 | 0.63 | — | — | |
| SCHEMBL15865990 | 0.61 | — | — | |
| SCHEMBL17680 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | claimed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| US-20240213017-A1 | METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-06-27 | — | — | US | disclosed |
| CN-110105383-B | Hydrocarbyloxydisilanes | 美国陶氏有机硅公司 | 2023-04-25 | — | — | CN | disclosed |
| US-20220402943-A1 | HYDROCARBYLOXYDISILANES | DDP SPECIALTY ELECTRONIC MAT US 9 LLC (US) | 2022-12-22 | — | — | US | disclosed |
| EP-3495373-B1 | HYDROCARBYLOXYDISILANES | DOW SILICONES CORP (US) | 2021-01-20 | — | — | EP | disclosed |
| US-20190211039-A1 | HYDROCARBYLOXYDISILANES | DDP SPECIALTY ELECTRONIC MATERIALS US 9, LLC | 2019-07-11 | — | — | US | disclosed |
| EP-3495373-A1 | HYDROCARBYLOXYDISILANES | Dow Silicones Corporation (US) | 2019-06-12 | — | — | EP | disclosed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | disclosed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | disclosed |
| US-20070173072-A1 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1717848-A1 | METHOD FOR PRODUCING SILICON OXIDE FILM | TOAGOSEI CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |