SCHEMBL23870908

SCHEMBL23870908

CC(I)C(=O)Oc1ccc(N)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 2/20 0.47
▸ TDP1 Q9NUW8 6/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ GLA P06280 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ MAPT P10636 1/20 0.41
▸ THRB P10828 1/20 0.41
▸ BLM P54132 1/20 0.41
▸ CASP6 P55212 1/20 0.41
▸ GFER P55789 1/20 0.41
▸ MAPK1 P28482 1/20 0.40
▸ PARP10 Q53GL7 1/20 0.40
▸ PRSS1 P07477 3/20 0.39
▸ PRSS2 P07478 3/20 0.39
▸ PRSS3 P35030 3/20 0.39
▸ F2 P00734 2/20 0.39
▸ PKM P14618 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ CYP3A4 P08684 4/20 0.39
▸ LMNA P02545 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4683823 0.84 ELANE (0.66) ELANETDP1KDM4EGLAGAA
Hydrochloric Acid SCHEMBL27456547 0.82 ELANE (0.63) ELANETDP1KDM4EGLAGAA
SCHEMBL239299 0.82 ELANE (0.48) ELANETDP1KDM4EGLAGAA
SCHEMBL3128225 0.82 ELANE (0.48) ELANETDP1KDM4EGLAGAA
Hydrochloric Acid SCHEMBL28267944 0.81 ELANE (0.47) ELANETDP1KDM4EGLAGAA
SCHEMBL21276510 0.80 ELANE (0.53) ELANETDP1GAAMAPTKMT2A
SCHEMBL17208954 0.79 LMNA (0.46) ELANETDP1KDM4EGLAGAA
SCHEMBL16262020 0.79 ELANE (0.46) ELANETDP1KDM4EGLAGAA
SCHEMBL22279461 0.79 KMT2A (0.56) ELANEMAPTMAPK1PARP10PKM
SCHEMBL4073205 0.79 ELANE (0.46) ELANETDP1KDM4EGLAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 — — US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 — — US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 — — US disclosed
Send feedback