SCHEMBL23870909

SCHEMBL23870909

CC(I)C(=O)Oc1ccc(C2CCN(C(=O)OC(C)(C)C)CC2)cc1

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NAMPT P43490 1/20 0.52
DDB1 Q16531 1/20 0.47
CRBN Q96SW2 1/20 0.47
GPR119 Q8TDV5 6/20 0.47
ALDH1A1 P00352 2/20 0.46
MAPT P10636 2/20 0.46
HTT P42858 2/20 0.46
NPC1 O15118 1/20 0.46
MAPK1 P28482 1/20 0.46
RAB9A P51151 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
KDM4E B2RXH2 1/20 0.46
THRB P10828 1/20 0.46
PTPN2 P17706 1/20 0.43
PTPN1 P18031 1/20 0.43
PTPN6 P29350 1/20 0.43
PDE4B Q07343 1/20 0.43
STS P08842 1/20 0.43
P2RY14 Q15391 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26785205 0.87 NAMPT (0.53) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL23411722 0.83 NAMPT (0.56) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL26082983 0.81 CCR1 (0.40) NAMPT
SCHEMBL22489653 0.81 ALDH1A1 (0.53) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL7871974 0.81 ALDH1A1 (0.67) NAMPTGPR119ALDH1A1MAPTHTT
SCHEMBL22996067 0.80 MAPT (0.67) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL18788903 0.80 NAMPT (0.60) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL23410873 0.79 NAMPT (0.52) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL29891881 0.79 NAMPT (0.52) NAMPTDDB1CRBNGPR119ALDH1A1
SCHEMBL21705801 0.79 NAMPT (0.49) NAMPTDDB1CRBNGPR119ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20230120132-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-20 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed